437 results about "Photosensitizing Agent" patented technology

A cleaning and whitening system for teeth having an electromagnetic radiation emitting toothbrush and a dentifrice with a photosensitive agent is disclosed. The toothbrush has a cleaning surface, such as bristles. The toothbrush is also adapted to direct electromagnetic radiation toward the cleaning surface. The electromagnetic radiation may be monochromatic or polychromatic. Further, the electromagnetic radiation may be substantially free of ultraviolet radiation. Additionally, the electromagnetic radiation may consist essentially of wavelengths within a range of 300 to 750 nanometers. The photosensitive agent is dispersed throughout the dentifrice. The dentifrice transmits the electromagnetic radiation through a varying thickness disposed over a target surface during use of the system. As a result, a significant portion of the photosensitive agent reacts, resulting in whitening stains, removing and/or disclosing undesired substances, and/or foaming. The dentifrice may be clear and may have clear abrasive particles. A method for tuning the cleaning and whitening system for teeth includes formulating the dentifrice with photosensitive agents that react to a range of electromagnetic radiation and providing a toothbrush that emits that electromagnetic radiation range. Another method of tuning the cleaning and whitening system includes designing a toothbrush that emits a range of electromagnetic radiation and formulating a dentifrice with photosensitive agents that react to the electromagnetic radiation range.

Resist compositions for photosensitive chemically amplified resist processing, as well as methods for processing substrates using a photosensitive chemically amplified resist are disclosed for improved CD uniformity. A resist composition or layer generates photosensitizer when the resist is exposed to a first wavelength of light. A second wavelength of light is later used to amplify an acid reaction. The radiation-sensitive layer also includes a photo-active agent that, when exposed to a third light wavelength, modifies a concentration of photosensitizer in the radiation-sensitive layer. The third light wavelength can be projected as a pattern of radiation using a digital pixel-based projection system, with the projected pattern based on a critical dimension signature. In a subsequent exposure step, the resist layer is exposed to light of the second wavelength that induces or amplifies the acid concentration within the photoresist film.

To provide a photosensitive resin composition in which a hardened film obtained from the photosensitive resin composition has properties comparable to those of a film hardened at a high temperature, a method for manufacturing a patterned hardened film using the photosensitive resin composition, and an electronic part. The photosensitive resin composition includes (a) a polybenzoxazole precursor having a repeating unit represented by a general formula (I):

wherein U and V represent a divalent organic group, and at least one of U and V is a group containing an aliphatic chain structure having 1 to 30 carbon atoms; (b) a photosensitizer; (c) a solvent; and (d) a crosslinking agent capable of causing crosslinking or polymerization by heating.

Methods for preventing damage to the epidermis during PDT induced using a pre-photosensitizing agent are provided. The methods of the present invention utilize spatial confinement to control formation of a photoactive species from a topically-applied pre-photosensitizing agent. In one embodiment, thermal inhibition is used to prevent the metabolism of a pre-photosensitizing agent in epithelial tissue surrounding a treatment site. In another embodiment, a chemical inhibitor can be applied to the epithelial tissue to inhibit the conversion of a pre-photosensitizing agent into a phototoxic species.

The present invention is drawn to methods for photodynamic therapy (PDT) of a target cell, target tissue or target composition in a mammalian subject, using a therapeutically effective amount of a targeted substance, which is either a targeted photosensitizing agent, or a photosensitizing agent delivery system, or a targeted prodrug. This targeted substance preferably selectively binds to the target cell, target tissue or target composition. Light at a wavelength or waveband corresponding to that which is absorbed by the targeted substance is then administered. The light intensity is relatively low, but a high total fluence is employed to ensure the activation of the targeted photosensitizing agent or targeted prodrug product.

The invention relates to a powder coating with a low-temperature curing function. The powder coating comprises the following components in percentage by weight: 40-60 percent of unsaturated polyester resin, 20-25 percent of epoxy resin, 1-5 percent of photosensitizer, 0.5-1.5 percent of flatting agent, 0.1-1 percent of defoaming agent, 15-25 percent of filler, 8-15 percent of transparent iron oxide pigment and 0.1-0.5 percent of white carbon black. The powder coating with alow-temperature curing function is high in transparency, bright in color and low in curing temperature; when the powder coating is sprayed, the powder coating is preheated to 50-70 DEG C and maintained at the temperature for 5-8min, then subjected to electrostatic spraying, blown by hot air with the temperature being about 120 DEG C for 20min and then naturally cooled; and the powder coating is suitable for coating of wooden materials.

The invention relates to an ultraviolet radiation two-step grafting method on the surface of polyethylene fiber with ultrahigh molecular weight. The method comprises the following steps of: coating a photosencitizer on the surface of preprocessed polyethylene fiber with ultrahigh molecular weight; soaking the polyethylene fiber in a first grafting monomer solution; forming a surface dormant group by adopting ultraviolet radiation or direct illumination; then, soaking in a second grafting monomer solution; initiating a secondary monomer surface free radical grafting reaction by ultraviolet radiation or heating; and finally, post-processing. Compared with the prior art, the invention has the advantages that the polar group is introduced to the surface of the polyethylene fiber with ultrahigh molecular weight, the reaction is controllable, the grafting efficiency and the grafting rate are higher, the second monomer with higher reaction activity is grafted on a primary grafting basis, and the adhesive performance of a matrix and the polyethylene fiber with ultrahigh molecular weight is greatly improved.

On a wafer coated with photosensitizing agent, plural shots of exposure are applied through a mask including a plurality of reticles each of which has a circuit pattern and a top surface identification information, while the mask and the wafer are relatively moved. Then the wafer is developed and etched to form convex or concave reticle numbers (top surface identification information) on a metal layer which is the uppermost part or a part close to the uppermost part of the wafer. The reticle numbers enables to distinguish each of reticles on the mask. Next, an under surface identification information is recorded on an under surface of the wafer by laser marking or another method. The under surface identification information enables to distinguish each of the shots of exposure.

Disclosed are: a photosensitive modified polyimide resin composition having photo-fabrication property, which is excellent in the electric properties and adhesion as well as in the heat resistance, flexibility, bending property, low warping, chemical resistance and storage stability; a resin film formed from the composition; and a printed circuit board, flexible printed circuit board (FPC) and the like which comprises the film as an insulating protective film and/or interlayer insulation film. The photosensitive modified polyimide resin composition comprises a modified polyimide of a specific structure having a flexible structure such as polycarbonate; a photosensitizer; a curing agent; and a solvent.

The embodiments include method of nonlinear optical photodynamic therapy of tissue including the steps of providing pulsed infrared laser light for two-photon excited fluorescence tissue exposure, and selectively focusing the pulsed infrared laser light within the tissue at a focal plane to activate a photosensitizing agent to generate free radicals within a highly resolved axial and lateral spatial domain in the tissue. The invention is also directed to an apparatus for performing nonlinear optical photodynamic therapy of tissue including a pulsed infrared laser for providing two-photon excited fluorescence beam tissue exposure, a scanner for selectively and controllably moving the tissue and the beam relative to each other, and optics for selectively focusing the pulsed infrared laser light within the tissue at a point in a focal plane to activate a photosensitizing agent to generate free radicals within a highly resolved axial and lateral spatial domain in the tissue.

The invention discloses a modified polypropylene non-woven fabric, its preparation method and application. The preparation method comprises: impregnating a polypropylene non-woven fabric in a grafting solution containing a graft monomer, a crosslinking agent, a non-ionic surfactant and a photosensitizer, and initiating graft polymerization under ultraviolet irradiation, thus obtaining the modified polypropylene non-woven fabric, which can be widely used in adsorption separation treatments of dye wastewater, heavy metal ion wastewater, inorganic anion acid radical-containing chemical wastewater and the like as a filtering material. The modified polypropylene non-woven fabric provided by the invention has the characteristics of high mechanical strength, large water flux, and great saturated adsorption capacity. Meanwhile, after being subjected to a regeneration treatment in a cationic surfactant-containing ethanol solvent desorption solution, the adsorbed filtering material can be recycled.

The invention relates to a low viscosity UV/moisture dual-curing polyurethane hot melt adhesive and a preparation method thereof, belonging to the technical field of photocuring adhesives. The low viscosity UV/moisture dual-curing polyurethane hot melt adhesive comprises the following components in parts by weight: 95-97 parts of UV/moisture dual-curing polyester polyether polyurethane, 1-3 partsof free radical photoinitiator, 0.25-2 parts of cationic photoinitiator, 0.25-1 part of photosensitizer, 0.06-0.35 part of polyurethane catalyst, 0.01-0.02 part of water reducing agent, and 0.05-0.2 part of antioxidant. The hot melt adhesive can be used for the bonding of opaque substrates. The viscosity of the adhesive at the sizing temperature 110 DEG C is in the range of 2000-2500 mPa.s, the viscosity is low, the construction is convenient, the initial viscosity is strong, the positioning is fast, the holding time is shortened, even the holding pressure is not needed. The hot melt adhesivedoes not contain small molecular active diluent and is environmentally friendly. The preparation process is simple, easy to operate and suitable for industrial production.

Disclosed is a positive photosensitive resin composition which can reduce warping of a substrate such as a semiconductor wafer or the like even when the positive photosensitive resin composition is subjected to dehydration ring closing by the application of a thermal history; a cured film; a protecting film; an insulating film; a semiconductor device; and a display device. The positive photosensitive resin composition comprises a polyamide resin mainly composed of a polybenzoxazole precursor and being patterned on the substrate such as a semiconductor wafer or the like by coating, exposure and development. The cured film is obtained by subjecting the positive photosensitive resin composition containing a polyamide resin mainly composed of a polybenzoxazole precursor to dehydration ring closing. The protecting film comprises the cured film. Specifically disclosed is a positive photosensitive resin composition comprises a polyamide resin (A) and a photosensitizing agent (B), wherein the polyamide resin comprises a repeating unit (A-1) represented by the general formula (1), and a repeating unit (A-2) represented by the general formula (2) and/or a repeating unit (A-3) represented by the general formula (3).

The invention provides a positive photosensitivity polyamide acid ester resin composition, a preparation method and application thereof. The resin composition comprises the following components in portion by weight: 10 to 70 portions of the soluble polyamide acid ester resin, 100 to 1,000 portions of an organic solvent, 0.1 to 50 portions of a photosencitizer, 0.1 to 50 portions of a photosensitizer additive, and 0.1 to 50 portions of a built-in adhesion promoter, wherein the soluble polyamide acid ester resin is prepared from aromatic diacid chloride diester containing fluorin, aromatic diamine and mixture thereof, and a molecular weight conditioning agent. The positive photosensitivity polyamide acid ester resin performs a photodegradation reaction after exposure through ultraviolet ray (i ray and g ray), and after an exposure area is dissolved by an aqueous solvent, a pattern with high resolution can be obtained. Furthermore, a polyimide layer membrane formed after being heated and cured has low specific inductive capacity, low water absorbing capacity, excellent thermal stability, mechanical performance and optical performance.

The invention discloses a single-component UV delayed curing adhesive composition as well as a preparation method and an application method thereof, and belongs to the technical field of radiation curing adhesives. The adhesive composition comprises light-cured oligomer resin, an acrylate reactive diluent, epoxy resin, a curing agent, a photoinitiator and a free radical inhibitor, wherein the photoinitiator is formed by mixing a photobase generator and a photosensitizer. The preparation method of the UV curing adhesive composition is simple, the UV curing adhesive composition can be applied toadhesion between lightproof base materials, the adhesive applied to the surfaces of the base materials cannot be cured immediately after being irradiated by ultraviolet light, a certain operation time window can be provided to meet lap joint shaping between the base materials under different application scenes, and subsequently, sufficient bonding between the base materials can be achieved through post-curing. The adhesive composition is high in assembly efficiency, has relatively good bonding strength after being cured, and has a good application prospect in the fields of electronic components, space flight and aviation, automobile machinery, building materials and the like.

A positive photosensitive resin composition of at least one uncapped polybenzoxazole precursor polymer, at least one capped polybenzoxazole precursor polymer, at least one photosensitive agent and at least one solvent, use of such compositions to pattern an image on a substrate and the resulting relied patterned substrates and electronic parts therefrom.

The invention provides a waterproof paint, which comprises a composition A and a composition B, wherein the composition A comprises the following components in percentage by weight: 35 to 55 percent of methyl methacrylate resin, 0.5 to 1.5 percent of photosensitizer, 2 to 4.5 percent of accelerating agent, 18 to 35 percent of butyl methacrylate, 3 to 9 percent of butyl acrylate and 15 to 35 percent of silicon micro powder; the composition B comprises the following components in percentage by weight: 25 to 45 percent of methyl methacrylate resin, 0.7 to 2 percent of light stabilizer, 3 to 5 percent of initiator, 20 to 45 percent of methyl methacrylate resin, 5 to 15 percent of butyl acrylate, 10 to 30 percent of silicon micro powder and 0.4 to 1.2 percent of paraffin; and the weight ratio of the composition A to the composition B is 1:1-1:1.5. A waterproof layer formed by the waterproof paint has strong adhesive force, good flexibility, high strength and excellent thermostability, and can be exposed outdoors for long term, and has strong weather resistance and good waterproofness.

The exemplary embodiments of the present invention provides exemplary methods for adhering biological membranes to luminal anatomical structures using photosensitizing agents and electromagnetic energy. The exemplary embodiments of the present invention also provides method for stabilizing luminal anatomical structures. Further, exemplary embodiments of the present invention provide arrangements for coupling to a luminal anatomical structure.

The invention provides high-flash-point low-condensation-point transformer oil. Narrow fraction naphthenic oil is taken as basic oil, and an antioxidant, a condensation depressant, a photosensitizing agent and a metal deactivator are added, wherein the narrow fraction naphthenic oil accounts for 97-98% of the transformer oil in percentage by weight, the antioxidant accounts for 0.5-1.0% of the transformer oil in percentage by weight, the condensation depressant accounts for 0.5-1.0% of the transformer oil in percentage by weight, the photosensitizing agent accounts for 0.1-0.5% of the transformer oil in percentage by weight, and the metal deactivator accounts for 0.1-0.5% of the transformer oil in percentage by weight. The invention further provides a preparation method of the high-flash-point low-condensation-point transformer oil. The closed-cup flash point of the transformer oil provided by the invention can be 195-220 DEG C, the condensation point of the transformer oil can be up to minus 55 DEG C, the security property of the transformer oil is greatly better than that of the conventional transformer oil, and the transformer oil is applicable to extremely cold areas because of the low condensation point. The transformer oil is excellent in gassing performance, and no gas can be easily generated after the transformer oil is used.