Photosensitive resin, preparation method and application thereof

A photosensitive resin and reaction technology, applied in the field of photosensitive materials, can solve the problems of affecting the graphics accuracy of the development effect, increasing the difficulty of the development operation, and the residue of heat-resistant resin, so as to meet the stability requirements, excellent heat resistance, good heat resistance, etc. photosensitive effect

Pending Publication Date: 2020-04-14
FUYANG XINYIHUA MATERIAL TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] CN102830589A discloses a negative photoresist resin composition and a preparation method thereof. The negative photoresist resin composition includes a photoinitiator, an alkali-soluble resin, a polymerizable monomer and a solvent; the alkali-soluble resin includes A terpolymer formed by the reaction of organic ester monomers, organic acid monomers, and organic acid chloride monomers in the presence of additives, and the molar ratio of organic ester monomers, organic acid monomers, and organic acid chloride monomers 6:1:3~6:3:1; the negative photoresist resin composition has higher photosensitive speed and operability, using a proximity exposure machine and developing in 0.04

Method used

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  • Photosensitive resin, preparation method and application thereof
  • Photosensitive resin, preparation method and application thereof
  • Photosensitive resin, preparation method and application thereof

Examples

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Effect test

Embodiment 1

[0055] This embodiment provides a kind of photosensitive resin, the structure is as follows:

[0056]

[0057] Its preparation method comprises the following steps:

[0058]

[0059] Put 190g of bisphenol anthrone and 700g of epichlorohydrin in a 1000mL reaction bottle, add 50g of sodium hydroxide, and react at room temperature for 24h; add hydrochloric acid to neutralize, wash with water until neutral, spin dry, and recrystallize from ethanol to obtain bisphenol anthracene Keto glycidyl ether 200g, the yield is 80%.

[0060]

[0061] Bisphenol anthrone glycidyl ether 25g, acrylic acid 72g and catalyst triphenylphosphorus PPh obtained by step (1) 3 Placed in a reaction kettle, with propylene glycol methyl ether acetate PMA as solvent, under N 2 The reaction was carried out at 120° C. for 24 hours under protection; after the reaction, the reaction liquid was washed with water until neutral, and spin-dried to obtain 22 g of bisphenol anthrone glycidyl ether diacrylate...

Embodiment 2

[0064] This embodiment provides a kind of photosensitive resin, the structure is as follows:

[0065]

[0066] The difference between its preparation method and the preparation method in Example 1 is that the tetrahydrophthalic anhydride in step (3) is replaced by an equimolar amount of hexahydrophthalic anhydride to obtain the photosensitive resin.

Embodiment 3

[0068] This embodiment provides a kind of photosensitive resin, the structure is as follows:

[0069]

[0070] The difference between its preparation method and the preparation method in Example 1 is that the biphenyltetracarboxylic dianhydride in step (3) is mixed with an equimolar amount of 3,3',4,4'-diphenylmethyl ether tetraacid di anhydride (that is, oxydiphenyltetracarboxylic dianhydride) to obtain the photosensitive resin.

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Abstract

The invention provides photosensitive resin, a preparation method and an application thereof. The photosensitive resin has a structure as shown in a formula I, is an alkali-soluble resin, and heat resistance, stability and photosensitivity can be remarkably improved through a special design of a molecular structure and introduction of anthracene ketone groups. The photosensitive resin can be subjected to a chemical crosslinking reaction under light irradiation to form a stable condensate insoluble in an alkali liquor so that a photoresist composition containing the photosensitive resin has excellent developing performance, adhesion, pattern precision and thermal stability. The photosensitive resin is suitable for a negative photoresist composition and is especially suitable for photoresistfor a black matrix, and a pattern obtained after exposure and development has good collimation, resolution and the excellent thermal stability. The photosensitive resin can be used for preparing a high-precision microstructure, and a stability requirement of the photoresist for multiple high-temperature baking processes in a processing process can be fully met.

Description

technical field [0001] The invention belongs to the technical field of photosensitive materials, and in particular relates to a photosensitive resin and its preparation method and application. Background technique [0002] The color filter is an important component of the liquid crystal display. The white light from the backlight passes through the red, green and blue pigment photoresist of the color filter, and is filtered into red light, green light and blue light, and finally mixed into human eyes. color image. The quality of the color filter will directly affect the quality of the liquid crystal display. According to the application requirements, it mainly includes the color filter structure of red, green and blue. In the actual production process, the color filter structure of the three colors is mostly They are respectively formed by using photoresists of different colors and undergoing multiple exposures and developments. Therefore, how to improve the quality of the...

Claims

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Application Information

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IPC IPC(8): G03F7/038C08G63/547G02F1/1335G02B5/20
CPCG03F7/0388C08G63/547G02F1/133512G02B5/20
Inventor 贾刚刚霍学兵张盼赵明王雪岚梁珂
Owner FUYANG XINYIHUA MATERIAL TECH
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