Anti-reflection low-radiation glass and hollow glass
A low-emissivity glass, anti-reflection technology, applied in climate sustainability, climate change adaptation, passive houses, etc., can solve the problems of high production cost and complex film structure, and achieve good processability and chemical stability. , The effect of strong wear resistance
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0080] The structure of the anti-reflection low-emissivity glass 100 sequentially includes:
[0081] The glass original sheet 20 is 6mm ultra-clear glass, and the thermal barrier layer group 10 is from the surface of the glass original sheet 20 to one side, wherein,
[0082] The first dielectric layer 11 is made of SiNx material with a thickness of 16 nm;
[0083] The second dielectric layer 12 is made of SiOx material with a thickness of 17 nm;
[0084] The functional layer 13 is made of ITO material with a thickness of 83 nm;
[0085] The metal layer 14 is made of NiCr material with a thickness of 2mm;
[0086] The third dielectric layer 15 is made of SiOx material with a thickness of 23 nm;
[0087] The fourth dielectric layer 16 is made of SiNx material with a thickness of 27 nm;
[0088] The first protective layer 17 is made of TiN material with a thickness of 4 mm;
[0089] From the surface of the glass original sheet 20 to the other side of the anti-reflection laye...
Embodiment 2
[0105] The structure of the anti-reflection low-emissivity glass 100 sequentially includes:
[0106] The glass original sheet 20 is 6mm ultra-clear glass, and the thermal barrier layer group 10 is from the surface of the glass original sheet 20 to one side, wherein,
[0107] The first dielectric layer 11 is made of SiNx material with a thickness of 21 nm;
[0108] The second dielectric layer 12 is made of SiOx material with a thickness of 24 nm;
[0109] The functional layer 13 is made of ITO material with a thickness of 76 nm;
[0110] The metal layer 14 is made of NiCr material with a thickness of 3mm;
[0111] The third dielectric layer 15 is made of SiOx material with a thickness of 21 nm;
[0112] The fourth dielectric layer 16 is made of SiNx material with a thickness of 34 nm;
[0113] The first protective layer 17 is made of TiN material with a thickness of 4 mm.
[0114] From the surface of the glass original sheet 20 to the other side of the anti-reflection laye...
PUM
| Property | Measurement | Unit |
|---|---|---|
| thickness | aaaaa | aaaaa |
| thickness | aaaaa | aaaaa |
| thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
Login to View More 

