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Positive photo-resist composition

A technology of photoresist and photoresist layer, which is applied in the direction of optics, optomechanical equipment, and photosensitive materials used in optomechanical equipment, and can solve problems such as toxicity, uneven coating, and odor

Inactive Publication Date: 2004-07-21
SAMSUNG DISPLAY CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, compositions containing ethyl lactate have poor adhesion to substrates and do not coat uniformly on substrates
Ethylene glycol monoethyl ether acetate and propylene glycol monoethyl ether acetate are toxic and produce a foul odor

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0032] A photoresist composition comprising 6.43% by weight of photosensitive chemicals, 19.47% by weight of polymer resin, 70.4% by weight of 3-methoxybutyl acetate and 3.70% by weight of 4-butyrolactone was added dropwise onto a 4-inch bare glass plate and spin the glass plate at a constant spin speed. Then, at a temperature of 135° C., the above-mentioned glass plate was heated and dried for 90 seconds to obtain a photoresist film layer with a thickness of 1.60 μm on the glass plate. Using a mask, the resulting glass plate was exposed to ultraviolet light, and then immersed in an aqueous solution of 2.38% by weight of tetramethylammonium hydroxide (TMAH) for 75 seconds to remove the exposed part, thereby obtaining a photoresist pattern .

[0033]It has now been found that the photoresist compositions according to the invention have good photosensitivity. Also, since the thickness will increase linearly with increasing rotation speed, the thickness of the layer can also be...

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PUM

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Abstract

A photoresist composition including a polymer resin for forming a photoresist layer, a photosensitive chemical that changes the solubility of the photoresist layer when exposed to some form of radiation and 3-methoxybutyl acetate and 4-butyrolactone as a solvent, is provided. The composition has a good photosensitivity and remainder ratio and no unpleasant odor.

Description

technical field [0001] The present invention relates to a kind of positive type photoresist composition for making fine circuit figure such as liquid crystal display device circuit or semiconductor integrated circuit, relate in particular to a kind of polymer resin that is used to form photoresist layer , photosensitive chemicals and solvents without bad odor positive photoresist composition. Background technique [0002] In order to form fine circuit patterns as used in liquid crystal display (LCD) circuits or semiconductor integrated circuits, etc., the photoresist layer composition is first evenly coated or applied on the insulating layer or conductive metal layer on the substrate . The coated or applied photoresist composition substrate is then exposed through a mask to some form of radiation such as ultraviolet light, electrons or X-rays. The exposed substrate is developed to form the desired pattern. The patterned photoresist layer is used as a mask to etch the insu...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/039C08K5/28C08L61/10G03F7/004G03F7/022G03F7/023H01L21/027
CPCG03F7/0226G03F7/0048G03F7/039
Inventor 罗振豪李有京朴弘植罗允静金玑洙姜圣哲康升镇
Owner SAMSUNG DISPLAY CO LTD
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