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Positive type photo-anticorrosion composite material

A photoresist and photoresist layer technology, applied in optics, optomechanical equipment, photosensitive materials for optomechanical equipment, etc. Problems such as poor adhesion of the etching composition to the substrate

Inactive Publication Date: 2004-08-25
SAMSUNG DISPLAY CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, if ethyl lactate is used, the adhesion of the photoresist composition to the substrate is poor, and it is difficult to uniformly coat the substrate.
Ethylene glycol mono ethylether acetate and propylene glycol mono ethylether acetate have the disadvantages of being harmful to the human body or producing a strong odor during operation

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0031] On a 4-inch bare glass, spin coating includes 6.43% by weight of sensitizer, 19.47% by weight of polymer resin, 59.3% by weight of 3-methoxybutylacetate (3-methoxybutylacetate), 11.1% by weight of 2 - Heptanone (2-heptanone) and 3.70% by weight of 4-butyrolactone (4-butylolactone) photoresist composition, then at a temperature of 135 ° C, the above-mentioned glass plate is heated for 90 seconds, and dried to form A photoresist film with a thickness of 1.60 μm was prepared. After putting a mask on the above-mentioned glass plate, irradiating ultraviolet rays, and then immersing in an aqueous solution of 2.38% by weight of tetramethylammonium hydroxide (TMAH) for 75 seconds, the part exposed by ultraviolet rays was removed, thereby forming Photoresist pattern.

[0032] It has been found that the photoresist compositions of the present invention have good sensitivity. The rotation speed during spin coating was increased from 950rpm to 1400rpm, and soft baking was carried...

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PUM

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Abstract

The present invention provides a positive photoresist composition excellent in exposure speed, the rate of a residual film, etc., and capable of improving the work environment because a slight offensive odor is emitted. The positive photoresist composition contains a polymer resin for forming a photoresist film, a photosensitive compound which varies the solubility of the photoresist film by exposure and 3-methoxybutyl acetate, 2- heptanone and 4-butyrolactone as solvents.

Description

technical field [0001] The present invention relates to a kind of positive photoresist composition used for manufacturing microcircuits such as liquid crystal display device circuit or semiconductor integrated circuit, particularly relates to a kind of positive photoresist composition, and it comprises for forming Polymer resin, photosensitive compound and solvent of photoresist layer. Background technique [0002] In order to form fine circuit patterns such as liquid crystal display (LCD) circuits or semiconductor integrated circuits, first uniformly coat a layer of photoresist composition on an insulating layer or a conductive metal layer formed on a substrate, and then coat it with In the case of a mask, the coated photoresist composition is exposed to, for example, ultraviolet, electron or x-ray radiation. After development, the desired pattern is formed. Using the patterned photoresist layer as a mask, the above-mentioned metal film or insulating film is etched, and t...

Claims

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Application Information

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IPC IPC(8): G03F7/039C08K5/28C08L61/10G03F7/004G03F7/022G03F7/023H01L21/027
CPCG03F7/0226G03F7/0048G03F7/039
Inventor 周振豪李有京朴弘植罗允静金玑洙姜圣哲康升镇
Owner SAMSUNG DISPLAY CO LTD
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