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Controlled conversion of metal oxyfluorides into superconducting oxides

A technology of oxyfluoride and oxide, applied in the manufacture/processing of superconductor devices, superconducting devices, superconducting/high-conducting conductors, etc.

Inactive Publication Date: 2004-12-29
MASSACHUSETTS INST OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

For example, the MOD method using metal trifluoroacetate was used to prepare thinner (70-80nm) YBa 2 Cu 3 o y (YBCO) film (where the value of y should be sufficient to obtain superconducting properties at a temperature of at least 77K), its Tc>92K, Jc>5×10 6 A / cm 2 (77K, selffield), however it is not possible to use such techniques to prepare much thicker films with similar properties
Indeed, prior to the development of the processing technology described in this patent application, there was no solution based on deposition processing capable of producing high Jc films with a thickness greater than 0.5 microns

Method used

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  • Controlled conversion of metal oxyfluorides into superconducting oxides
  • Controlled conversion of metal oxyfluorides into superconducting oxides
  • Controlled conversion of metal oxyfluorides into superconducting oxides

Examples

Experimental program
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preparation example Construction

[0094] Said solution for spin coating is prepared by reacting acetate salts of metals (Ba, Y, Cu) and trifluoroacetic acid in water, and drying the obtained product to a semi-solid state (glassy) , and then redissolved the product in methanol. Using the stoichiometric amounts of metal acetate and trifluoroacetic acid, the final solution of the obtained mixed metal trifluoroacetate in methanol was set, wherein the ratio of metals Ba:Y:Cu was 2:1:3.

[0095] The larger LaAlO3 single crystal was cut with a diamond wire saw to obtain the substrate. The thickness of the substrate is 0.020 inch and its typical dimensions are about 1 / 4 inch by 1 / 4 inch, although any size substrate can be used, even long wire or ribbon substrates can benefit from the method of the present invention.

[0096] The substrate is chemically and mechanically cleaned prior to spin coating. Ultrasonic cleaning was performed in chloroform, acetone, and methanol, respectively, and then wiped with low-hardness...

Embodiment 1

[0109] This example prepares thicker YBCO oxide superconducting thin films from TFA precursors at relatively low annealing temperatures.

[0110] During this heat treatment (see Figure 10 ), within the first 3 minutes of the initial ramp, 0.01% dry O 2 The mixed gas is injected into the process environment. Due to the time difference between the heating of the furnace equipment and the heating of the heating element of the heating furnace, the temperature of the sample at this moment is still approximately room temperature. Subsequently, the input gas was switched to high humidity (roughly in the range of 95-100% RH at room temperature) 0.01% O 2 mixed composition. During the rest of the warming, the humid low P O2 Ambient gas is passed through the sample and the elevated temperature is maintained until the last 10 minutes of the elevated temperature. The holding temperature was about 700°C (about 10°C fluctuation range, with an initial temperature overshoot of about 10°...

Embodiment 2

[0113] In this example, YBCO oxide superconducting thin films were prepared from TFA precursors by annealing at relatively low humidity. The low-humidity gas is obtained by mixing the high-humidity gas with the dry gas at the very last moment before injection into the processing environment using a manually operated high precision flow meter.

[0114] Sample preparation and furnace equipment were as described in Example 1, with the following changes. At the annealing temperature, from the beginning of the heat treatment until the last 10 minutes, inject low humidity 0.1% O 2 mixed composition. At this point inject dry 0.1% O 2 mixed composition. The humidity of the wet mixed gas used was 1.2% RH at room temperature. The annealing temperature was 785°C (approximately 5°C fluctuation range with essentially no temperature overshoot). The heat treatment of this example is as Figure 11 shown. The critical current density of the treated film is 1.1 × 10 6 A / cm 2 .

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Abstract

An oxide superconductor article is provided having an oxide superconductor film having a thickness of greater than 0.5 microns disposed on a substrate, said article having a transport critical current density (Jc) of greater than or equal to about 105 A / cm2 at 77K, zero field. The oxide superconductor film is characterized by high Jc and high volume percent of c-axis epitaxial oxide grains, even with thicknesses of up to 1 micron. The oxide superconductor article is prepared by providing a metal oxyfluoride film, said metal oxyfluoride film comprising the constituent metallic elements of an oxide superconductor in substantially stoichiometric proportions; and converting the metal oxyfluoride into the oxide superconductor at a rate of conversion selected by adjusting a reaction parameter selected from the group consisting of temperature, PH2O, PO2, and time and combinations thereof, such that an oxide superconductor film having a transport critical current density of greater than or equal to about 105 A / cm2 at 77K, zero field is obtained.

Description

technical field [0001] The invention relates to a highly oriented oxide superconducting thin film. More specifically, the present invention relates to a method for converting thin films containing metal oxides and metal oxyfluorides into oxide superconducting thin films. Background technique [0002] The discovery of superconducting ceramic oxides has led to enormous efforts to fabricate these oxides into films and coatings with high performance. In general, the formation methods of high temperature superconducting (HTSC) thin films can be divided into two fields: physical methods and chemical methods. [0003] Physical methods include reactive evaporation, manganese sputtering, electron beam deposition, and laser ablation. Although physical deposition methods are capable of forming high-quality films, these deposition methods generally have relatively slow formation rates and require high vacuum environments, resulting in high costs. Furthermore, such techniques are most...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C30B29/22C23C14/06C23C16/30H01B12/06H01B13/00H10N60/01
CPCH01L39/2451Y10S505/742Y10S428/93H10N60/0548
Inventor 约翰A·史密斯迈克尔J·奇马内维尔·索南伯
Owner MASSACHUSETTS INST OF TECH
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