Dry cleaning method for plasma reaction chamber
A plasma and reaction chamber technology, applied in cleaning methods and utensils, cleaning hollow objects, chemical instruments and methods, etc., can solve the problems of time-consuming preventive maintenance cycle, reduced production capacity, etc.
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[0027] In order to make the above-mentioned purposes, features and advantages of the present invention more obvious and easy to understand, the preferred embodiments are specifically cited below, together with the accompanying drawings, and are described in detail as follows:
[0028] The dry cleaning method of the plasma reaction chamber according to the embodiment of the present invention will be described below with reference to FIG. 1 . Please refer to FIG. 1 , which shows a flow chart of a dry cleaning method after a metal etching process according to an embodiment of the present invention, which is applicable to a front-end array fabrication process of a TFT-LCD. Firstly, step S10 is performed to provide a product substrate, such as a glass substrate, on which a metal layer for making gate lines, such as molybdenum-aluminum-rubidium alloy, is formed. Next, a photoresist pattern layer is formed on the metal layer to define the pattern of the gate lines by means of a conve...
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