Preparation method of modified film by nanometer titanium dioxide doped of noble metal rare earth oxide
A nano-titanium dioxide and rare earth oxide technology, which is applied to devices for coating liquid on surfaces, pretreatment surfaces, coatings, etc., can solve problems such as application limitations, achieve low manufacturing cost, simple process, and inhibit the formation of urine scale Effect
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Embodiment 1
[0017] The glass substrate that makes silicon dioxide spacer layer in (2) step is placed in containing and contains 15% butyl titanate prepared by (3) program, 1% analytical pure nitric acid 2% acetylacetone, 1.0% cerium nitrate , soaked in 0.001% Henkel LS-45, 0.5% ammonium fluoride sol for 2 minutes, pulled out the substrate at a speed of 10 cm / min, placed it in a 120°C oven to evaporate the solvent, and then used 1700KHz An ultrasonic spraying device was used to spray solution B on the substrate at a moving speed of 50 cm / min. In a nitrogen atmosphere, heat at a rate of 2-10°C / min, heat to 500°C and keep it warm for 1-2 hours. Sample 1 was prepared.
Embodiment 2
[0019] Place the glass substrate of the silicon dioxide spacer made in (2) step into the cerium nitrate containing 18% butyl titanate, 1% nitric acid, 3% acetylacetone, 1.2% prepared by (3) procedure, Soak in 0.001% Henkel LS-45, 1% ammonium fluoride sol for 2 minutes, pull out the substrate at a speed of 10 cm / min, place it in a 120°C oven to evaporate the solvent, and then use a 1700KHz Ultrasonic spraying device, solution B is sprayed on the substrate at a moving speed of 50 cm / min. In a nitrogen atmosphere, heat at a rate of 2-10°C / min, heat to 500°C and keep it warm for 1-2 hours. Sample 2 was obtained.
Embodiment 3
[0021] The glass substrate that makes silicon dioxide spacer layer in (2) step is placed in containing 20% butyl titanate prepared by (3) program, 1% analytical pure nitric acid, 3% acetylacetone, the nitric acid of 1.5% Soak cerium, 0.001% Henkel LS-45, 5% ammonium fluoride sol for 2 minutes, pull out the substrate at a speed of 10 cm / min, place it in a 120°C oven to evaporate the solvent, and then use 1700KHz ultrasonic spray device, spray solution B on the substrate at a moving speed of 50 cm / min. In a nitrogen atmosphere, heat at a rate of 2-10°C / min, heat to 500°C and keep it warm for 1-2 hours. Sample three was obtained.
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