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Rutile phase based TiO2 low radiation filming glass capable of toughening and its technics

A low-emissivity coating and rutile phase technology, applied in the field of low-emission coated glass, can solve the problems of spots on coated glass, reduce low-emission performance, etc., and achieve good appearance effect and photothermal performance

Active Publication Date: 2007-08-15
SHANGHAI YAOHUA PILKINGTON GLASS GROUP +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0011] The infiltration of sodium ions, the condensation of silver particles and the oxidation of the silver layer will cause spots and fogging on the coated glass, which will reduce the low-radiation performance

Method used

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  • Rutile phase based TiO2 low radiation filming glass capable of toughening and its technics

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Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0030] The coating thickness and the coating process of each film layer of the present invention are as follows:

[0031] Base dielectric layer:

[0032] The base dielectric layer consists of two layers, one layer is TiO with rutile structure deposited by bipolar intermediate frequency pulse power supply 2 , and the other layer is ZnO.

[0033] Titanium dioxide TiO 2 Coating: TiO 2 It is deposited in an argon-oxygen atmosphere, the power is 40kw-50kw, the film thickness is 25nm-30nm, the pulse power frequency is 15kHz-25kHz, and the duty ratio of the voltage pulse is 4:10-6:10.

[0034] ZnO layer: ZnO is deposited in an argon-oxygen atmosphere with a power of 15kw-20kw and a film thickness of 4nm-6nm.

[0035] Silver layer: Ag is deposited in an argon atmosphere with a power of 5kw and a film thickness of about 12nm.

[0036] Barrier layer: Sputter nickel-chromium alloy in an argon-oxygen atmosphere with a power of 5kw and a film thickness of 2-3nm.

[0037] Upper dielec...

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Abstract

The invention provides a low-radiation coated glass by proceeding tempering treatment after coating to avoid effect to exterior, optic property and heat property; take rutile-phase TiO2 as substratum dielectric medium produced by bipolar impulsing power source sputtering technique, among, substratum dielectric medium is made up of two layers, one is rutile-phase TiO2 settled by bipolar intermediate frequency impulsing power source, the other is ZnO; select proper thickness and film composition of other layers to produce low-radiation coated glass which could be used in the condition of high-temperature heat processing

Description

technical field [0001] The invention relates to sputtering titanium dioxide TiO in rutile phase by using a bipolar intermediate frequency pulse power supply 2 , is the base dielectric layer, and produces low-emissivity coated glass that can be tempered and its production process. Background technique [0002] Low-emissivity coated glass (also known as LOW-E glass) is a film system product composed of multiple layers of metal or other compounds coated on the surface of the glass. Due to the low emissivity of the silver layer, the low emissivity glass has a high transmittance to visible light, a high reflectivity to infrared rays, and good heat insulation performance. [0003] The film layer structure of ordinary low-emissivity glass produced by vacuum magnetron sputtering method is generally: glass / base dielectric layer / silver layer / barrier layer / upper dielectric layer. [0004] The material of the base dielectric layer is generally a metal or non-metal oxide or nitride, su...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C03C17/34C03C17/06C03C17/23C23C14/34
Inventor 王茂良安吉申吴斌张建军潘浩军
Owner SHANGHAI YAOHUA PILKINGTON GLASS GROUP