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Silver halide emulsion and silver halide photosensitive material

A photosensitive material and silver halide technology, applied in photosensitive materials, emulsified silver emulsion, optics, etc., can solve undisclosed problems such as high brightness and darkness

Inactive Publication Date: 2002-12-25
FUJIFILM CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, these documents do not disclose the specific function of providing high shades in ultra-high intensity exposures using emulsions containing silver bromide-containing phases and / or silver iodide-containing phases

Method used

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  • Silver halide emulsion and silver halide photosensitive material
  • Silver halide emulsion and silver halide photosensitive material
  • Silver halide emulsion and silver halide photosensitive material

Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0300] (Sensitizing dye D) Preparation of emulsion G-2

[0301] The emulsion was prepared in the same manner as emulsion G-1, except that when the silver nitrate was added to 90%, an aqueous potassium iodide solution in an amount of 0.1 mol% / mol of the final silver halide was added and vigorously stirred. A silver halide emulsion was obtained, in which cubic silver iodochloride particles with an isospheric diameter of 0.35 μm and a coefficient of variation of 10% accounted for about 100% of the total projected area. The emulsion thus obtained was named Emulsion G-2. Preparation of emulsion G-3

[0302] The emulsion was prepared in the same manner as emulsion G-1, except that when the addition of silver nitrate reached 80%-90%, the amount of potassium bromide of the final silver halide was 2mol% / mol and stirred vigorously. A silver halide emulsion was obtained, in which cubic silver bromochloride particles with an isospheric diameter of 0.35 μm and a coefficient of variation of 10...

Embodiment 2

[0348]A thin layer sample was produced as in Example 1, except that the layer structure was changed as follows. Sample production The first layer (blue light-sensitive emulsion layer) Emulsion B-1 0.14 Gelatin 0.75 yellowing agent (ExY-2) 0.34 Color image stabilizer (Cpd-1) 0.04 Color image stabilizer (Cpd-2) 0.02 Color image Stabilizer (Cpd-3) 0.04 Color image stabilizer (Cpd-8) 0.01 Solvent (Solv-1) 0.13 Second layer (color mixing inhibitor layer): Gelatin 0.60 Color mixing inhibitor (Cpd-19) 0.09 Color image stabilizer ( Cpd-5) 0.007 Color image stabilizer (Cpd-7) 0.007 Ultraviolet absorber (UV-C) 0.05 Solvent (Solv-5) 0.11 Third layer (green light sensitive emulsion layer): Emulsion G-1 0.14 Gelatin 0.73 Finished product Red agent (ExM) 0.15 Ultraviolet absorber (UV-A) 0.05 Color image stabilizer (Cpd-2) 0.02 Color image stabilizer (Cpd-7) 0.008 Color image stabilizer (Cpd-8) 0.07 color image stabilizer (Cpd-9) 0.03 color image stabilizer (Cpd-10) 0.009 color image stabilizer ...

Embodiment 3

[0362] The photosensitive material of Example 2 was used for imaging by laser scanning exposure.

[0363] As the laser beam source, a blue semiconductor laser (disclosed by Toa Kagaku in a lecture of the 48th Applied Physics Association held in March 2001) with a wavelength of 430nm-450nm or by using LiNbO with a waveguide type conversion domain structure 3 The SHG crystal changes the wavelength of about 470nm emitted by the wavelength of the semiconductor laser (vibration wavelength about 940nm), by using LiNbO with a waveguide-type conversion domain structure 3 The SHG crystal changes the wavelength of about 532nm emitted by the wavelength of the semiconductor laser (vibration wavelength about 1060nm), and the wavelength of about 685nm of the red semiconductor laser (trade name: HL6738MG, produced by Hitachi Ltd.) or the red semiconductor laser (trade name: HL6501MG, produced by Hitachi Ltd.) has a wavelength of about 650nm. The laser beams of these three colors are moved perpen...

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Abstract

The present invention provides a silver halide emulsion comprising silver halide grains, wherein the content of silver chloride in said silver halide grains is at least 89 mol%, and wherein said silver halide grains contain at least one of the following: (i ) at least one phase selected from the group consisting of a laminated phase containing silver bromide, a laminated phase containing silver iodide, and a phase containing silver bromide and having a maximum point where the proportion of silver bromide content is at a maximum, wherein the maximum point is at Inside the silver grains, and (ii) the silver iodide-containing phase and the silver bromide-containing phase, the silver bromide-containing phase is located further inside the silver halide grains than the silver iodide-containing phase. Furthermore, the present invention provides a silver halide photosensitive material containing the silver halide emulsion.

Description

Technical field [0001] The invention relates to a silver halide emulsion and a silver halide photosensitive material. More specifically, the present invention relates to a silver halide emulsion which is suitable for rapid processing and provides high sensitivity and high brightness even under digital exposure conditions such as laser scanning exposure. The present invention also relates to the use of the silver halide emulsion The silver halide photosensitive material. Background technique [0002] In recent years, digitization has become very popular in the field of color printing using color photographic printing paper. For example, in comparison with a common similar exposure system that uses a color printer to directly print from a processed color negative film, a digital exposure system using laser scanning exposure has spread rapidly. This digital exposure system is characterized by obtaining high-quality images through image processing, and greatly co...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03C1/035G03C1/09
CPCG03C1/035G03C1/09G03C2001/091G03C2001/093G03C1/08G03C2001/0357G03C2001/03535G03C2001/03517
Inventor 大岛直人米仓修飨场聡
Owner FUJIFILM CORP