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Process method of pore based on photolithograph

A processing method and technology of capillary holes, which are applied in spinneret assemblies, textiles and papermaking, electrolysis processes, etc., can solve the problems of adhesion between injection molding materials and molds, loss of precision of spinneret capillaries, etc., and achieve good consistency, Suitable for mass production, high precision effect

Inactive Publication Date: 2004-03-17
SHANGHAI JIAO TONG UNIV
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  • Summary
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  • Application Information

AI Technical Summary

Problems solved by technology

The disadvantages of this method are: the injection molding material will adhere to the mold when the injection molding is demolded; the shrinkage of the material will cause the size of the spinneret pores to change and lose precision; and this method still needs a synchrotron radiation light source and a special gold mask

Method used

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  • Process method of pore based on photolithograph
  • Process method of pore based on photolithograph

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Embodiment Construction

[0016] Such as figure 1 Shown, provide following embodiment in conjunction with the content of the inventive method:

[0017] (1) Draw a plan view of the cross-sectional shape of the spinneret capillaries on the entire spinneret, and determine the shape of the spinneret capillaries (can have a variety of hole shapes), quantity, and positional relationship, and make a mask according to this plan plate;

[0018] (2) The spinneret with the guide holes processed is filled with paraffin wax, and the surface is cleaned. A layer of 800-1000 angstrom metal copper film is sputtered on the surface of the spinneret. Throw a thin layer of photoresist (AZ4330) 1-2 microns, and leave a photoresist film 5-10 microns larger than the guide hole at the guide hole by photolithography. Use wet etching (ferric chloride solution) to remove the metal copper film that is not protected by photoresist, and then use acetone to remove the photoresist protective layer to obtain a metal copper film, so ...

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Abstract

The present invention belongs to the field of chemical fiber producing technology, and is spinning jet capillary bore machining method based on photoetching. Mask is first made based on the shape ofspinning capillary bores, homogeneous thick photoresist layer is then formed on conducting substrate, and through further ultraviolet exposure and electroforming the metal structure is obtained, withthe photoresist in spinning capillary pores being finally eliminated. The said technological process can machine spinning board with complicated pores and pores in different shapes, and the technological process has high flexibility, high identity, high precision and low cost and is suitable for mass production. The present invention provides one new method for machining spinning jet capillary pores.

Description

technical field [0001] The invention relates to a method for processing spinneret capillary holes, in particular to a method for processing spinneret capillary holes based on photolithography, and belongs to the technical field of chemical fiber production. Background technique [0002] The spinneret is an indispensable precision part of the spinning machine. The spinneret holes on the spinneret are composed of guide holes and spinneret capillaries. As the spinneret of the chemical fiber precursor, its quality is an important condition to ensure the quality of the finished fiber and a good spinning process. With the development of the chemical fiber industry characterized by "new synthetic fibers", higher requirements are put forward for the manufacture and quality of spinnerets. The spinneret pores are also developing in the direction of microporosity, special-shaped, and composite. The processing quality of the spinneret mainly depends on the processing quality of the sp...

Claims

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Application Information

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IPC IPC(8): C25D1/08C25D1/10D01D4/02
Inventor 刘景全陈迪
Owner SHANGHAI JIAO TONG UNIV
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