Process method of pore based on photolithograph

A processing method and technology of capillary holes, which are applied in spinneret assemblies, textiles and papermaking, electrolysis processes, etc., can solve the problems of adhesion between injection molding materials and molds, loss of precision of spinneret capillaries, etc., and achieve good consistency, Suitable for mass production, high precision effect

Inactive Publication Date: 2004-03-17
SHANGHAI JIAO TONG UNIV
View PDF0 Cites 11 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The disadvantages of this method are: the injection molding material will adhere to the mold when the injection molding is demolded; the shrinkage of the material

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Process method of pore based on photolithograph
  • Process method of pore based on photolithograph

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0016] Such as figure 1 Shown, provide following embodiment in conjunction with the content of the inventive method:

[0017] (1) Draw a plan view of the cross-sectional shape of the spinneret capillaries on the entire spinneret, and determine the shape of the spinneret capillaries (can have a variety of hole shapes), quantity, and positional relationship, and make a mask according to this plan plate;

[0018] (2) The spinneret with the guide holes processed is filled with paraffin wax, and the surface is cleaned. A layer of 800-1000 angstrom metal copper film is sputtered on the surface of the spinneret. Throw a thin layer of photoresist (AZ4330) 1-2 microns, and leave a photoresist film 5-10 microns larger than the guide hole at the guide hole by photolithography. Use wet etching (ferric chloride solution) to remove the metal copper film that is not protected by photoresist, and then use acetone to remove the photoresist protective layer to obtain a metal copper film, so ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The present invention belongs to the field of chemical fiber producing technology, and is spinning jet capillary bore machining method based on photoetching. Mask is first made based on the shape ofspinning capillary bores, homogeneous thick photoresist layer is then formed on conducting substrate, and through further ultraviolet exposure and electroforming the metal structure is obtained, withthe photoresist in spinning capillary pores being finally eliminated. The said technological process can machine spinning board with complicated pores and pores in different shapes, and the technological process has high flexibility, high identity, high precision and low cost and is suitable for mass production. The present invention provides one new method for machining spinning jet capillary pores.

Description

technical field [0001] The invention relates to a method for processing spinneret capillary holes, in particular to a method for processing spinneret capillary holes based on photolithography, and belongs to the technical field of chemical fiber production. Background technique [0002] The spinneret is an indispensable precision part of the spinning machine. The spinneret holes on the spinneret are composed of guide holes and spinneret capillaries. As the spinneret of the chemical fiber precursor, its quality is an important condition to ensure the quality of the finished fiber and a good spinning process. With the development of the chemical fiber industry characterized by "new synthetic fibers", higher requirements are put forward for the manufacture and quality of spinnerets. The spinneret pores are also developing in the direction of microporosity, special-shaped, and composite. The processing quality of the spinneret mainly depends on the processing quality of the sp...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): C25D1/08C25D1/10D01D4/02
Inventor 刘景全陈迪
Owner SHANGHAI JIAO TONG UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap