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Substrate processing apparatus

A substrate processing device and substrate technology, which are applied in the directions of transportation and packaging, gaseous chemical plating, cleaning methods and utensils, etc., can solve the problem of high dust risk

Inactive Publication Date: 2004-11-03
DAINIPPON SCREEN MTG CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Therefore, there is a high risk of dust generation accompanying handover operations

Method used

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  • Substrate processing apparatus
  • Substrate processing apparatus
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Embodiment Construction

[0039] Preferred embodiments of the present invention will be described below with reference to the accompanying drawings.

[0040]

[0041] figure 1 It is a longitudinal sectional view showing the internal structure of the substrate processing apparatus 1 according to one embodiment of the present invention. figure 2 , image 3 respectively from figure 1 Horizontal cross-sectional views seen when observing positions II-II and III-III. Figure 4 It is a conceptual diagram showing the configuration of piping and the like attached to the substrate processing apparatus 1 . Below, first, refer to Figure 1 ~ Figure 4 The device configuration of the substrate processing device 1 will be described.

[0042] The substrate processing apparatus 1 is an apparatus that collectively transports a plurality of substrates (hereinafter, "multiple substrates" are simply referred to as "substrates") W, and performs chemical treatment, water washing (pure water treatment) and drying on...

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Abstract

A substrate processing apparatus of the present invention is surrounded by a hermetic member, and the internal space thereof is divided by a hermetic member into a rinse and dry processing chamber, a first and second liquid chemical processing chambers, and a substrate transport chamber. Openings for allowing transportation of substrates to and from corresponding chambers are capable of being exposed and blocked by open / close mechanisms including sealing means. Hence, substrates being processed can be transported in an environment isolated from outside an external atmosphere containing oxygen, to thereby suppress formation of unnecessary oxide films or generation of water marks on the surfaces of substrates while being transported. Further, exhaust emission can be reduced, which emission serves to prevent diffusion of an atmosphere containing vapor of a liquid chemical to the outside of the substrate processing apparatus.

Description

technical field [0001] The present invention relates to a substrate processing apparatus for performing predetermined processing on substrates such as semiconductor substrates, glass substrates for liquid crystal display devices, glass substrates for photolithography masks, and substrates for optical discs. Background technique [0002] Conventionally, in the substrate processing step, the substrate surface is processed by immersing the substrate in various processing liquids. Figure 13 It is a schematic diagram showing an example of a conventional substrate processing apparatus. [0003] exist Figure 13 Among them, the substrate processing apparatus 101 mainly includes a plurality of processing tank groups, a drying chamber 120 , and a transfer mechanism for transferring a substrate W. As a plurality of treatment tanks, chemical solution tanks 111, 113 storing chemical solutions such as corrosive liquid, and water washing tanks 112, 114 storing pure water as rinsing liqui...

Claims

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Application Information

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IPC IPC(8): B08B3/04B08B3/00B08B7/00C23C16/00H01L21/00H01L21/304H01L21/677
CPCH01L21/67207H01L21/67757H01L21/67028H01L21/6719
Inventor 前川直嗣广江敏朗
Owner DAINIPPON SCREEN MTG CO LTD
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