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Multi oxidant based sizing material for nickel hard disk flattening

An oxidant and planarization technology, applied in the field of planarization, can solve the problem of short storage time of slurry

Inactive Publication Date: 2004-12-01
ROHM & HAAS ELECTRONICS MATERIALS CMP HLDG INC
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  • Summary
  • Abstract
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  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, this metal catalyst causes the decomposition of the oxidizing agent, making the storage time of the slurry very short

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0028] Experimental procedure

[0029] Mix appropriate amounts of chemicals and abrasives in a 5 gallon bucket to make a slurry. By adding a sufficient amount of 70% HNO 3 and 10N NaOH to adjust the pH to the desired pH. Hydrogen peroxide (30%) was purchased from Ashland Chemical Co. of Dublin, Ohio. Oxone  Triple salt (potassium peroxymonosulfate; molecular formula: 2KHSO 5 ·KHSO 4 ·K 2 SO 4 ) and other chemicals were obtained from Sigma-Aldrich Corp. of St. Louis, Missouri. Nalco 2360 was used as abrasive particles.

[0030] Experimental polishing with rigid hard drive. The disks were electroless Ni-P deposited aluminum substrates manufactured by Komag Inc., San Jose, California.

[0031] Planarization experiments were performed on a Model 6EC single side polisher manufactured by Strasbaugh, Inc. of San Luis Obispo, Calif., using a Model DPM 2000 polishing pad manufactured by Rodel Inc., Newark, Delaware. The polishing parameters are as follows:

[0032] Polishi...

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PUM

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Abstract

A slurry composition for planarizing nickel or nickel-alloy coating on substrates, such as a nickel coating on a memory hard disk, includes at least two oxidizers, an abrasive, water, and no metal catalyst. The composition is effective for polishing nickel (Ni) and nickel alloys coatings formed in the manufacture of memory disks.

Description

technical field [0001] The present invention relates to planarization, and more particularly to oxidizer-containing slurries for planarization of coatings, such as nickel-based coatings, used in applications such as storage hard disk manufacturing. Background technique [0002] Most modern computers have a magnetic storage disk ("hard disk") for storing and retrieving various information. Memory disks are rigid and are usually made of an aluminum alloy substrate with a nickel (Ni) coating or a nickel alloy coating, such as a nickel-phosphorus (Ni-P) coating. The coating is produced by electroplating and usually has a rough surface. Therefore, before applying an active magnetic surface coating, it is necessary to polish or "planarize" the coating. [0003] A preferred method of planarizing Ni coatings or nickel alloy coatings such as Ni-P is chemical mechanical planarization, or "CMP". In CMP, the slurry composition used not only etches the metal surface, but also polishes...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B24B37/00C01B11/20C01B15/01C01B15/08C09D1/00C09K3/14G11B5/84H01L21/304
CPCC01B15/08C01B15/01C01B11/20G01B3/1071G01B2003/1074
Inventor J·G·埃米恩刘振东J·匡希
Owner ROHM & HAAS ELECTRONICS MATERIALS CMP HLDG INC
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