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Preparation method for TiOxNy highly effective solar photo-thermal conversion film

A technology of light-to-heat conversion and solar energy, applied in ion implantation plating, metal material coating process, coating, etc., can solve the problems of increasing the demand for solar spectrum selective thin-film heat-absorbing plate cores, and the difficulty of vacuum tubes, etc., to achieve the goal of promoting The effect of clean and environmentally friendly production

Inactive Publication Date: 2005-03-16
GUANGZHOU YUEHAI VACUUM TECH +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] An objective problem of existing vacuum tube solar heat collectors is that vacuum tubes are not easy to be combined with the overall structure of building plates and buildings. , realize the integration of solar energy utilization and building, promote the widespread use of solar water heaters, solar air conditioners and other photothermal products, and the expansion of the types and application scope of photothermal products will greatly increase the demand for solar spectrally selective thin-film heat-absorbing panels. needs

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0022] Operation steps: 1) Remove the contamination layer and oxide layer on the surface of the copper plate core; 2) Place the copper plate core on the sample holder of the magnetron sputtering machine, with a distance of 5 cm from the target base; 3) Vacuumize and bake to improve the vacuum quality, set Set the baking temperature at 60°C, and the background vacuum reaches 5×10 -3 Pa; 4) Introduce 42 sccm of argon gas through the mass flow meter, and adjust the vacuum degree of the vacuum chamber to 0.5Pa; 5) Turn on the target power supply, sputtering current 5A, and clean the surface of the pre-sputtering Ti target; 6) Rotate the sample holder and pass Oxygen 8sccm, nitrogen 4sccm, sputtering working pressure 0.5Pa, current 5A, sputtering 5min; 7) Oxygen 8sccm, nitrogen 8sccm, sputtering working pressure 0.5Pa, current 5A, sputtering 15min; 8) stop.

[0023] Technical indicators:

[0024] The absorptivity of the film is 0.94, and the infrared emission rate is 0.07.

[002...

Embodiment 2

[0028] Operation steps: 1) Remove the contamination layer and oxide layer on the surface of the copper plate core; 2) Place the copper plate core on the sample holder of the magnetron sputtering machine, with a distance of 5 cm from the target base; 3) Vacuumize and bake to improve the vacuum quality, set The fixed baking temperature is 90°C, and the background vacuum reaches 5×10 -3Pa: 4) Introduce 42 sccm of argon gas through the mass flow meter, and adjust the vacuum degree of the vacuum chamber to 0.5 Pa; 5) Turn on the target power supply, sputtering current 5A, and clean the surface of the pre-sputtering Ti target; 6) Rotate the sample holder and pass Oxygen 10sccm, nitrogen 4sccm, keep sputtering working pressure 0.6Pa, current 5A, sputtering 5min; 7) oxygen 10sccm, nitrogen 12sccm, keep sputtering working pressure 0.6Pa, adjust sputtering current to 5.5A, sputtering 15min; 8) shutdown.

[0029] Technical indicators:

[0030] The absorptivity of the film is 0.92, and ...

Embodiment 3

[0034] Operation steps: 1) Remove the contamination layer and oxide layer on the surface of the copper plate core; 2) Place the copper plate core on the sample holder of the magnetron sputtering machine, with a distance of 7 cm from the target base; 3) Vacuumize and bake to improve the vacuum quality, set The fixed baking temperature is 180°C, and the background vacuum reaches 8×10 -3 Pa; 4) Introduce 42 sccm of argon gas through the mass flow meter, and adjust the vacuum degree of the vacuum chamber to 0.5 Pa; 5) Turn on the target power supply, sputtering current 5A, and clean the surface of the pre-sputtering Ti target; 6) Rotate the sample holder and pass Oxygen 8sccm, nitrogen gradually adjusted 1-8sccm, every 5min the flow rate increases by 1sccm, keep the sputtering working pressure 0.5Pa, current 5A, sputtering 40min; 7) Shut down.

[0035] Technical indicators:

[0036] The absorptivity of the film is 0.92, and the infrared emission rate is 0.15.

[0037] The color ...

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Abstract

A TiOxNy highly effective solar energy light-heat conversion film preparation method comprises the following steps: (1) cleaning ailming substrate (2) opening vacuum coating chamber, placing ailming substrate on sample pivoted frame (3) baking vacuum coating chamber and turning on corresponding pump cooling water system, vacuum-pumping to background vacuum (4)letting Ar into vacuum coating chamber through mass flowmeter, adjusting air pressure for sputtering (5)starting direct current target power, ionizing Ar, adjusting power sputtering current, presputtering to remove target surface compound of Ti metallic target (6) introducing nitrogen and oxygen through mass flowmeter for reactive sputtering, segmental or continuous adjusting filming parameter, depositing in turn absorption layer and chemical compound reduced reflecting layer of different metal content, (7)stopping the machine and picking out film sample. The inventive process is environment friendly. Said film has property of high light-heat conversion efficiency and long life, can be broadly applied to heat collecting surface of solar energy light-heat conversion field.

Description

Technical field [0001] The invention relates to a method for preparing a spectrally selective absorption thin film material for high-efficiency solar light-to-heat conversion by magnetron sputtering coating technology. Background technique [0002] The most direct and effective way to utilize solar energy is to convert solar energy into thermal energy for utilization, and the efficiency of solar collectors is mainly determined by two factors, one is the ability of the collector to absorb solar radiation; the other is the heat dissipation of the collector degree of loss. The general principle of improving its efficiency is to absorb solar radiation energy as much as possible and reduce heat loss as much as possible, and the spectrally selective absorption film is a surface that has good absorption performance for short-wave radiation of the sun and only a small amount of heat radiation. Therefore, the use of solar spectrum selective absorption film is one of the most effecti...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/06C23C14/34
Inventor 林洪沈辉汪保卫陈达
Owner GUANGZHOU YUEHAI VACUUM TECH
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