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Method for making high accuracy grey scale masks

A technology of gray scale mask and manufacturing method, which is applied in the direction of photoplate making process, optics, instruments, etc. of pattern surface, can solve the problem of high price of light energy beam sensitive glass mask, and achieve high surface finish and fidelity , the effect of reducing the depth

Inactive Publication Date: 2005-11-30
INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Using this high-precision grayscale mask can produce a micro-relief structure with a good surface finish, but the price of the light energy beam-sensitive glass mask is extremely expensive, and it belongs to a monopoly

Method used

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  • Method for making high accuracy grey scale masks
  • Method for making high accuracy grey scale masks
  • Method for making high accuracy grey scale masks

Examples

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Effect test

Embodiment 1

[0031] Embodiment 1, is to make a quadrangular pyramid structure by the method of the present invention, adopts positive photoresist to be photoresist material, and its manufacturing process is as follows:

[0032] (1) Calculate the required exposure distribution on the photoresist surface according to the quadrangular pyramid structure to be fabricated, and normalize the exposure distribution. In the case of shallow relief, the normalized exposure distribution on the resist surface is the same as the normalized distribution of the microstructure. When the relief depth is relatively deep, the exposure distribution on the resist surface can be accurately calculated according to the resist exposure and development model. .

[0033] (2) Since the light-attenuating material needs to have a high light-absorbing ability, black paint is selected as the light-attenuating material. Since the black paint has a very strong light-absorbing ability, it can be seen from formula (3) that the...

Embodiment 2

[0042] Embodiment 2, is to make a blazed grating by the method of the present invention, adopts positive photoresist as photoresist material equally, and its manufacturing process is as follows:

[0043](1) Calculate the exposure distribution required on the photoresist surface according to the blazed grating structure to be produced, and normalize the exposure distribution. In the case of shallow relief, the normalized exposure distribution on the resist surface Same as the normalized distribution of the microstructure, when the relief depth is relatively deep, the exposure distribution of the resist surface is accurately calculated according to the resist exposure and development model.

[0044] (2) Select black paint as the light-attenuating material, and apply the light-attenuating material on the surface of the mask base, and process the light-attenuating material according to the exposure distribution designed in step 1 by using existing diamond turning, laser ablation an...

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Abstract

A method for making mask plate with high accuracy and grey scale, which comprises following steps: a) choosing base material of mask plate, and coating light decay material on the surface of said base material, b) processing said light decay material into cameo structure demanded, c) coating a protective layer on the surface of said structure, and controlling light flux according to the light damping capacity difference of light decay material in different area, d) placing mask plate on photo resist directly, exposing and displaying. Said mask plate adopting this invention can accurately achieve one-step forming of folding element, reflective and diffractive hybrid element and two-dimension element.

Description

Technical field [0001] The invention relates to a manufacturing method of a high-precision grayscale mask, which can be used to form a micro-relief structure with any surface shape and smooth surface on the resist surface in one step. Background technique [0002] The fabrication method of continuous relief microlens array with high surface finish has been a research hotspot all the time. This was discussed in the roto-camera method disclosed on page 197 of Volume 21, Issue 4, Issue 4 of "Physics" published in 1992. At present, the methods used for forming continuous micro-relief structures mainly include "photolithography thermal fusion method", "moving mask method", "laser direct writing method", "half-tone mask method" and so on. The first two methods can only produce micro-relief elements with certain structural features. Laser direct writing can be used to form microstructures with arbitrary surface shapes, but this method belongs to single-piece processing, so the pr...

Claims

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Application Information

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IPC IPC(8): G03F1/38
Inventor 董小春杜春雷李淑红
Owner INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI