Method for purifying gas of nitrogen trifluoride

A purification method, nitrogen trifluoride technology, applied in the preparation of fluoride, nitrogen and non-metallic compounds, etc.

Active Publication Date: 2006-02-01
派瑞科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Thermal cracking to release N 2 f 2 Impurity gas refers to the gas that will contain N 2 f 2 NF of impurities 3 The gas

Method used

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Embodiment Construction

[0008] The materials selected for the cracking tower equipment and packing in the present invention can be low-carbon steel, stainless steel, copper, nickel, Monel and other metal materials, among which copper, nickel, and Monel are the best. Among the above-mentioned materials, Monel material is resistant to F 2 The corrosiveness is the best, the catalytic activity of nickel is the best, the heat transfer effect of copper is the best, and the processing cost of low carbon steel is the lowest. In order to effectively control the increase of other impurities after cracking, the material of the cracking tower equipment is best to use corrosion-resistant metals such as 304L, 316L, 317L, copper, nickel or Monel, among which Monel is the best. The material of the filler is preferably pure nickel with better activity, and the purity of nickel is ≥99.5%.

[0009] In order to increase the specific surface area of ​​the packing, it is best to process the packing into a shape such as a Pall...

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Abstract

A process for purifying NF3 gas containing N2F2, which is generated by electrolysis method, includes such steps as loading one or more of Fe, stainless steel, Cu, Ni and Monel alloy in cracking tower, heating to 100-400 deg.C, filling the gas mixture of NF3 and N2F2, and removing N2F2 by its high-temp decomposing.

Description

(1) Technical field [0001] The invention relates to a purification method of nitrogen trifluoride gas, which is suitable for NF prepared by electrolysis. 3 Gas purification. (2) Background technology [0002] NF 3 As a source of fluorine, gas is widely used in the fields of high-energy lasers and semiconductor industries, and has good application prospects. As the cleaning gas in the plasma CVD (‘chemical vapor deposition’ chemical vapor deposition) chamber and the etching gas in the plasma CDE (‘chemical deposition etch’ chemical deposition etching) process, NF 3 The gas is called "electronic gas". High purity NF 3 Gas is vital to the production of semiconductor components, and VLSI is critical to NF 3 The gas purity is required to be above 99.99%. [0003] NF prepared by electrolysis 3 N in the gas 2 F 2 Impurities are easily decomposed into N during the purification process 2 And F 2 If N 2 F 2 Impurities are enriched in the purification equipment to a certain extent, N 2 F 2 ...

Claims

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Application Information

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IPC IPC(8): C01B21/083C01B9/08
Inventor 付嫚李本东隋希平
Owner 派瑞科技有限公司
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