Prepn process of biomedical active TiO2 film
A biomedical and thin-film technology, applied in the field of preparation of TiO2 biomedical active thin films, can solve the problems of high application cost, low strength, and inability to shape, and achieve the effects of simple method, low cost, and firm bonding
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Embodiment 1
[0015] Put the polished Ti substrate of the medical implant into acetone and absolute ethanol solution for ultrasonic cleaning for 15 minutes, then rinse it with deionized water, and dry it for later use. A titanium target with a purity of 99.9% is fixed on the magnetron cathode target holder, and the medical implant base material to be treated after cleaning and drying is fixed on the sample base of the vacuum chamber of the magnetron sputtering system. The magnetic field strength in the sputtering area on the target surface is about 2800 Gauss, and the distance from the target surface to the substrate is 60mm. Bake the vacuum chamber before preparation, and wait for the background vacuum to reach 2×10 -3 At Pa, the target is cleaned by direct current glow sputtering after passing argon gas to 1Pa. After the titanium target is cleaned by sputtering, oxygen is introduced near the substrate. At this time, the flows of argon and oxygen are adjusted to 30 sccm and 6 sccm respect...
Embodiment 2
[0018] Put the polished Ti6Al4V base material of the medical implant into acetone and absolute ethanol solution for ultrasonic cleaning for 15 minutes, then rinse it with deionized water, and dry it for later use. A titanium target with a purity of 99.9% is fixed on the magnetron cathode target holder, and the Ti6Al4V substrate of the medical implant to be treated after cleaning and drying is fixed on the sample base of the vacuum chamber of the magnetron sputtering system. The magnetic field strength in the sputtering area on the target surface is about 2800 Gauss, and the distance from the target surface to the substrate is 110 mm. Bake the vacuum chamber before preparation, and wait for the background vacuum to reach 2×10 -3 At Pa, the target is cleaned by direct current glow sputtering after passing argon gas to 0.3Pa. After the titanium target is cleaned by sputtering, oxygen is introduced near the substrate. At this time, the flows of argon and oxygen are adjusted to 30...
Embodiment 3
[0021] Put the polished Ti6Al4V base material of the medical implant into acetone and absolute ethanol solution for ultrasonic cleaning for 15 minutes, then rinse it with deionized water, and dry it for later use. A titanium target with a purity of 99.9% is fixed on the magnetron cathode target holder, and the Ti6Al4V substrate of the medical implant to be treated after cleaning and drying is fixed on the sample base of the vacuum chamber of the magnetron sputtering system. The magnetic field strength in the sputtering area on the target surface is about 2800 Gauss, and the distance from the target surface to the substrate is 90 mm. Bake the vacuum chamber before preparation, and wait for the background vacuum to reach 2×10 -3 At Pa, the target is cleaned by direct current glow sputtering after passing argon gas to 0.3Pa. After the titanium target is cleaned by sputtering, oxygen is introduced near the substrate. At this time, the flows of argon and oxygen are adjusted to 30 ...
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