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Prepn process of biomedical active TiO2 film

A biomedical and thin-film technology, applied in the field of preparation of TiO2 biomedical active thin films, can solve the problems of high application cost, low strength, and inability to shape, and achieve the effects of simple method, low cost, and firm bonding

Inactive Publication Date: 2006-03-01
SHANGHAI JIAO TONG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Unfortunately, due to the low strength of ceramic materials, it is easy to break, and the required implants must be pre-ordered, which cannot be molded on site, and the application cost is high. Therefore, ceramic materials made of nanoparticles has its limitations in practical applications

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0015] Put the polished Ti substrate of the medical implant into acetone and absolute ethanol solution for ultrasonic cleaning for 15 minutes, then rinse it with deionized water, and dry it for later use. A titanium target with a purity of 99.9% is fixed on the magnetron cathode target holder, and the medical implant base material to be treated after cleaning and drying is fixed on the sample base of the vacuum chamber of the magnetron sputtering system. The magnetic field strength in the sputtering area on the target surface is about 2800 Gauss, and the distance from the target surface to the substrate is 60mm. Bake the vacuum chamber before preparation, and wait for the background vacuum to reach 2×10 -3 At Pa, the target is cleaned by direct current glow sputtering after passing argon gas to 1Pa. After the titanium target is cleaned by sputtering, oxygen is introduced near the substrate. At this time, the flows of argon and oxygen are adjusted to 30 sccm and 6 sccm respect...

Embodiment 2

[0018] Put the polished Ti6Al4V base material of the medical implant into acetone and absolute ethanol solution for ultrasonic cleaning for 15 minutes, then rinse it with deionized water, and dry it for later use. A titanium target with a purity of 99.9% is fixed on the magnetron cathode target holder, and the Ti6Al4V substrate of the medical implant to be treated after cleaning and drying is fixed on the sample base of the vacuum chamber of the magnetron sputtering system. The magnetic field strength in the sputtering area on the target surface is about 2800 Gauss, and the distance from the target surface to the substrate is 110 mm. Bake the vacuum chamber before preparation, and wait for the background vacuum to reach 2×10 -3 At Pa, the target is cleaned by direct current glow sputtering after passing argon gas to 0.3Pa. After the titanium target is cleaned by sputtering, oxygen is introduced near the substrate. At this time, the flows of argon and oxygen are adjusted to 30...

Embodiment 3

[0021] Put the polished Ti6Al4V base material of the medical implant into acetone and absolute ethanol solution for ultrasonic cleaning for 15 minutes, then rinse it with deionized water, and dry it for later use. A titanium target with a purity of 99.9% is fixed on the magnetron cathode target holder, and the Ti6Al4V substrate of the medical implant to be treated after cleaning and drying is fixed on the sample base of the vacuum chamber of the magnetron sputtering system. The magnetic field strength in the sputtering area on the target surface is about 2800 Gauss, and the distance from the target surface to the substrate is 90 mm. Bake the vacuum chamber before preparation, and wait for the background vacuum to reach 2×10 -3 At Pa, the target is cleaned by direct current glow sputtering after passing argon gas to 0.3Pa. After the titanium target is cleaned by sputtering, oxygen is introduced near the substrate. At this time, the flows of argon and oxygen are adjusted to 30 ...

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Abstract

The preparation process of biomedical active TiO2 film includes the following steps: cleaning and stoving the substrate; fixing titanium target and adjusting the distance between the target surface and the substrate to make the magnetic field strength in the sputtering area of the target be 2800 gauss; roasting the vacuum chamber in the magnetically controlled sputtering system, introducing argon and cleaning titanium target with sputtering DC glow; introducing oxygen to near the substrate, regulating the Ar / O2 flow ratio to 5-10, the total gas pressure of 0.3-4 Pa and sputtering power in 40-80 W to begin DC reaction and magnetically controlled sputtering to form film; and taking the sputtered sample with one layer of nanometer bioactive TiO2 film formed. The present invention is economical, and the film has firm combination to the implant and no damage to the implant and can raise the biocompatibility greatly of the implant.

Description

technical field [0001] The present invention relates to a preparation method in the technical field of biomaterials, in particular to a TiO 2 Preparation method of biomedical active film. Background technique [0002] The natural bone surface is composed of dense crystalline particles with a size of tens of nanometers. The surface protrusions are about several hundred nanometers, and protein molecules that play a decisive role in the attachment and growth of osteoblasts are adsorbed on them. The size is also nanometers. magnitude. Ordinary medical implant materials, such as titanium and titanium alloy implants, have a surface composed of micron particles, and the micron-scale surface protrusions are smooth at the nanoscale, thereby limiting the interaction between cells and the surface at the nanoscale, making this The combination between the like material and the bone tissue cannot be stable, causing the implant to loosen and fall off. Therefore, the preparation and proc...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): A61L27/02A61L31/02C23C14/35
Inventor 钟晓霞周威袁璐琦夏宇兴
Owner SHANGHAI JIAO TONG UNIV