Stepped and repeated illuminating and nano-imprinting device

Abstract

The invention discloses a nanometer stamping device of process repeated illumination, which comprises the following parts: pressure driving system, Z-direction calibration system, two-way CCD aligning system, inclined calibration structure, stamper, substrate, XYª’ working table, substrate bearing piece leveling system, big machine cabinet, control system, big host floor, violet even illuminating system and rack, wherein the bearing piece leveling system is set on the XYª’ working table to load substrate; the pressure driving system, Z-direction calibration system, inclined calibration structure, two-way CCD aligning system and violet even illuminating system are fixed on the rack. The invention adapts common violet illumination without elastic signet or casting mould as well as adding high temperature, pressure and reducing temperature, which applies the high precise alignment of CCD image to make more complex multiple-layer structure, large effective working area and easy extended nanometer image structure through process repeated manufacturing.

Description

technical field [0001] The invention is a step-by-step and repeated illumination nano-imprinting device, which belongs to the field of nano-graphic structure devices produced by micro-processing technology. Background technique [0002] With the rapid development of global communication technology and high-tech information technology, there is an urgent need for microfabrication technology to produce ultra-high-speed, ultra-high-frequency nanoscale IC devices, and the production of nano-pattern structures requires a substantial increase in the resolution of existing lithography technology . Generally, methods of shortening wavelength lithography are used, mainly including deep ultraviolet light, extreme ultraviolet light, X-ray, ion beam projection, and electron beam lithography. These methods all require an extremely short-wavelength light source electromagnetic radiation system and an optical system, which are technically very complicated, and at the same time, the invest...

AI Technical Summary

Problems solved by technology

The former needs to increase the temperature and pressure, and at the same time lower the temperature below the glass temperature of the polymer. The expansion coefficients of the stamper and the substrate are different, and the deformation during the embossing process makes it difficult to align and overprint the graphics. And it seems insufficient; the latter steps into flash embossing, which avoids the shortcomings of the former. Although the equipment has been developed, it can also be embossed in large quantities, but the structure is very complicated, the price is also very expensive, and the equipment technology is not perfect. The alignment and overprinting accuracy is not high, it is impossible to make overprinting multi-layer nanostructure graphics, the effective working area is small, and it is not conducive to popularization and application.

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