The invention discloses a nanometer stamping device of process repeated illumination, which comprises the following parts: pressure driving system, Z-direction calibration system, two-way CCD aligning system, inclined calibration structure, stamper, substrate, XYª working table, substrate bearing piece leveling system, big machine cabinet, control system, big host floor, violet even illuminating system and rack, wherein the bearing piece leveling system is set on the XYª working table to load substrate; the pressure driving system, Z-direction calibration system, inclined calibration structure, two-way CCD aligning system and violet even illuminating system are fixed on the rack. The invention adapts common violet illumination without elastic signet or casting mould as well as adding high temperature, pressure and reducing temperature, which applies the high precise alignment of CCD image to make more complex multiple-layer structure, large effective working area and easy extended nanometer image structure through process repeated manufacturing.