The invention discloses a nanometer
stamping device of process repeated illumination, which comprises the following parts: pressure driving
system, Z-direction calibration
system, two-way CCD aligning
system, inclined calibration structure, stamper, substrate, XYª working table, substrate bearing piece leveling system, big
machine cabinet,
control system, big host floor, violet even illuminating system and rack, wherein the bearing piece leveling system is set on the XYª working table to load substrate; the pressure driving system, Z-direction calibration system, inclined calibration structure, two-way CCD aligning system and violet even illuminating system are fixed on the rack. The invention adapts common violet illumination without elastic signet or
casting mould as well as adding high temperature, pressure and reducing temperature, which applies the high precise alignment of CCD image to make more complex multiple-layer structure, large effective working area and easy extended nanometer
image structure through process repeated manufacturing.