The invention provides a photoetching
mask imaging method considering a vector TCC implicit operator of polarization aberration and Lanczos
decomposition. The method comprises the following steps: determining a photoetching imaging model based on a
mask frequency spectrum and an effective source
point set; constructing a complex value Jones
pupil matrix according to the polarization aberration, the defocus phase and the aperture constraint, and sampling and splicing the
pupil matrix by using the polarization intensity component of the effective source point to form a
center frequency domain shift
pupil column vector library; in the solving process, based on the vector
library, an implicit vector cross
transfer function operator is realized in an operator multiplied
vector mode, and the characteristic value and the characteristic vector of the implicit operator are solved by using a Lanczos
algorithm so as to obtain a central
frequency domain block of a coherent component
decomposition (SOCS) kernel function; and in combination with the
mask frequency spectrum and each kernel function, weighting and accumulating according to characteristic values to obtain a space image of the mask. According to the method, explicit construction of a high-dimensional TCC matrix is avoided, physical consistency is guaranteed, meanwhile, memory overhead is remarkably reduced, and the
simulation efficiency of a photoetching imaging
system is improved.