Etching solution composition for titanium and aluminium cascade metal films

A metal laminated film and composition technology, applied in the field of etching solution composition of metal laminated film, can solve problems such as not being developed, and achieve the effects of easy control, improved coverage and excellent economy

Inactive Publication Date: 2006-08-30
KANTO CHEM CO INC
View PDF4 Cites 10 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In addition, an aqueous solution containing peroxodisulfate and fluoride has been disclosed as an etching solution for a metal laminated film composed of a titanium layer and a copper layer (Patent Document 4), but it does not apply to a metal laminate film composed of an aluminum layer and a titanium layer. solution for etching metal laminated films
[0008] Thus, a suitable method for etching titanium-aluminum metal laminates together has not been developed

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Etching solution composition for titanium and aluminium cascade metal films

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1～25

[0049] Such as figure 1 As shown, a substrate having titanium (700 Å) / aluminum (2500 Å) / titanium (200 Å) deposited on a glass substrate (1) by a sputtering method was prepared.

[0050] Then, a resist (4) was used to form a pattern on the titanium / aluminum / titanium metal laminated film, and immersed in the etching solution of Examples 1 to 25 in Table 1 (etching temperature: 30° C.). Thereafter, after washing with ultrapure water and drying with nitrogen gas, the shape of the substrate was observed with an electron microscope. The results are shown in Table 1.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention relates to an etching liquid compound, which can etch the metallic layered film made from titanium or the alloy whose main content is titanium or made from aluminum or the alloy whose main content is aluminum, that formed on glass insulated base plate, silicon base plate and compound semi-conductor base plate via splash method, without damaging the bottom base plate. And the invention can control taper degree in 30-90 degrees; the density of fluoride (fluohydric acid) is 0.01-5 mass%, nd the density of oxidant is 0.1-50 mass%.

Description

technical field [0001] The present invention relates to an etchant composition for metal lamination films of gate, source and drain electrodes of a liquid crystal display. Background technique [0002] Aluminum or aluminum alloys with impurities such as neodymium, silicon or copper added to it are used as gate, source and drain materials for liquid crystal displays because they are cheap and have very low electrical resistance. [0003] However, since the adhesion (adhesion) between aluminum or aluminum alloy and the glass substrate as the base film is somewhat poor, and it is easily corroded by chemical liquid and heat, the upper and / or lower parts of aluminum or aluminum alloy Molybdenum or a molybdenum alloy film is used as a laminated film as an electrode material, and the laminated film is etched together with an etchant using phosphoric acid or the like. [0004] In recent years, the price of molybdenum or molybdenum alloys has increased, and titanium or titanium allo...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): C23F1/16C23F1/20C23F1/26
Inventor 清水寿和
Owner KANTO CHEM CO INC
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap