Method for preparing garnet single crystal and garnet single crystal prepared thereby
A garnet and single crystal technology is applied in the field of the preparation of garnet single crystals and the garnet single crystals obtained therefrom, and can solve the problems of low reflectivity, unsuitable base flux and the like
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment 1
[0032] 67.286 g Bi 2 0 3 , 72.035 grams of PbO, 3.5 grams of B 2 o 3 , 0.556 g Y 2 o 3 , 0.516 g Gd 2 o 3 , 6.107 g Fe 2 o 3 and 1.9757 g Na 2 CO 3 Put it into a platinum crucible, then melt it at 1000°C, then cool the melt to 790°C, and prepare garnet single crystal from the melt by conventional LPE method using SGGG substrate.
Embodiment 2
[0034] A single crystal was prepared in the same manner as in Example 1, except that 4.0004 g of sodium carbonate was added.
experiment Embodiment 1
[0044] The defects of the garnet single crystals obtained in Examples 1 and 2 and Comparative Examples 1-4 were calculated. In addition, measure the thickness of residual flux after spinning off, and calculate the thickness deviation value. The results are shown in Table 1 below.
[0045] Example
serial number
composition
Na 2 CO 3
The amount (grams)
crystallization
long temperature
(℃)
thickness
(microns)
number of defects
(1 cm x 1
cm)
residual flux
Thickness (micron)
Thickness deviation
(microns)
Example 1
Bi 0.85 Pb 0.02 Y 0.60 Gd 1.53 P t0.02 Fe 4.98 o 12
1.9757
790
100
0~1
20
±1
Example 2
Bi 0.82 Pb 0.02 Y 0.66 Gd 1.56 Pt 0.02 Fe 4.98 o 12
4.0004
790
70
0~1
20
±1
Comparative example 1
Bi 0.90 Pb 0.02 ...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com