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Photosensitive resin composition

A technology of photosensitive resin and composition, which is applied in the field of photosensitive resin composition, can solve problems such as adverse effects of LCD manufacturing process, achieve the effect of improving storage stability and transmittance at room temperature, and excellent performance

Active Publication Date: 2011-03-30
DONGJIN SEMICHEM CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, when conventional epoxy-based acrylates are used, there are problems in the transmittance of the interlayer insulating film, storage stability, etc., so there is a problem that it has a bad influence on the LCD manufacturing process.

Method used

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  • Photosensitive resin composition
  • Photosensitive resin composition
  • Photosensitive resin composition

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0080] (acrylic copolymer production)

[0081] 10 parts by weight of 2,2'-azobis(2,4-dimethylvaleronitrile), 500 parts by weight of tetrahydroxyfuran, 25 parts by weight of methacrylic acid, 25 parts by weight of the compound of the above chemical formula 7 (where R is CH 3 , n is 1), the styrene of 15 parts by weight, the butyl methacrylate of 15 parts by weight and the dicyclopentene methacrylate of 20 parts by weight add in the flask that has cooling tube and stirrer, carry out nitrogen displacement After that, stir slowly. The temperature of the reaction solution was raised to 62° C., and the temperature was maintained for 10 hours to produce a polymer solution containing an acrylic copolymer.

[0082] In order to remove unreacted monomers in the polymer solution containing the acrylic copolymer, 100 parts by weight of the polymer solution was precipitated in a poor solvent of 1000 parts by weight of ether. Then, the poor solvent in which the unreacted substance was dis...

Embodiment 2

[0090] In the above-mentioned Example 1, when the acrylic copolymer is polymerized, 2-hydroxyethyl methacrylate is used as a monomer instead of the compound of Chemical Formula 7, except that, the same method as the above-mentioned Example 1 is implemented to produce a photosensitive permanent resin composition.

Embodiment 3

[0092] In the above-mentioned Example 1, when the acrylic copolymer is polymerized, 2-hydroxypropyl methacrylate is used as a monomer instead of the compound of Chemical Formula 7, except that, the same method as the above-mentioned Example 1 is implemented to produce a photosensitive permanent resin composition.

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PUM

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Abstract

The invention provides a photosensitive resin composition not only excellent in performances such as sensitivity, heat resistance and resolution, but in particular, significantly improved in storage stability at a normal temperature and transmittance, and suitable for forming an interlayer insulating film for the process of manufacturing a LCD. The photosensitive resin composition contains: (a) an acrylic copolymer obtained by copolymerizing (i) an unsaturated carboxylic acid, an unsaturated carboxylic acid anhydride or a mixture of these, (ii) a hydroxyl group-containing olefin unsaturated compound and (iii) an olefin unsaturated compound, and then eliminating monomers not contributing to the reaction; (b) a 1,2-quinone diazide compound; (c) an epoxy compound expressed by one of chemicalformulae 1 to 6; and (d) a solvent.

Description

technical field [0001] The present invention relates to a photosensitive resin composition. More specifically, the present invention relates to the following photosensitive resin composition. The photosensitive resin composition not only has excellent properties such as sensitivity, heat resistance, and resolution, but also has excellent storage stability at room temperature. And permeability has been significantly improved, suitable for the formation of interlayer insulating film LCD manufacturing process. Background technique [0002] In a TFT liquid crystal display element and an integrated circuit element, an interlayer insulating film is used to insulate and smoothen wirings arranged between layers. [0003] Recently, for an interlayer insulating film suitable for the manufacturing process of a liquid crystal display (LCD), the following photoresist material (photoresist) is required, which can improve backlight (backlight) efficiency, Reduce power consumption. [000...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/008G03F7/027G03F7/004G02F1/133G02F1/1333
CPCC08F290/06C08G77/16G02F1/133345G03F7/022G03F7/023G03F7/0233G03F7/027G03F7/032G03F7/033H01L27/1214
Inventor 吕泰勳金柄郁尹赫敏丘冀赫尹柱豹郑义澈金东明崔相角李浩真申洪大李东赫
Owner DONGJIN SEMICHEM CO LTD