Forming method for solar energy cell substrate suede structure

A technology of solar cells and suede, applied in the direction of circuits, electrical components, sustainable manufacturing/processing, etc., can solve problems such as difficult film removal, achieve the effects of shortening the manufacturing process time, less equipment, and reducing manufacturing costs

Inactive Publication Date: 2007-03-21
SEMICON MFG INT (SHANGHAI) CORP +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Some membranes are difficult to remove by conventional methods

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0027] The invention provides a method for forming a textured structure on the front surface of a solar cell. The inventive method comprises the following processing steps:

[0028] Step 1, with the silicon carbide (SiC) sand of 300 meshes with average grain size, under the pressure of 2.5Kg, the front side of silicon substrate carries out sand blasting treatment, removes some films on the front side of silicon substrate, for example, silicon nitride ( SiN) film, titanium nitride (TiN) film, silicon carbide (SiC) film. Through sandblasting, the defective silicon layer is exposed to the outside, and the front of the silicon substrate forms a rough surface with a roughness greater than 0.3 μm, while the back of the silicon substrate maintains a smooth surface;

[0029] Step 2, immerse the silicon substrate with a rough structure on the front side into an acid etching solution. After this etching treatment, the front side of the silicon crystal substrate has a rough suede struct...

Embodiment 2

[0040] The invention provides a method for forming a textured structure on the front surface of a solar cell. The inventive method comprises the following processing steps:

[0041] Step 1, with the silicon carbide (SiC) sand of 250 meshes with average grain size, under the pressure of 3.0Kg, the front side of silicon substrate carries out sand blasting treatment, removes some films on the front side of silicon substrate, for example, silicon nitride ( SiN) film, titanium nitride (TiN) film, silicon carbide (SiC) film. Through sandblasting, the defective silicon layer is exposed to the outside, and the front of the silicon substrate forms a rough surface with a roughness greater than 0.3 μm, while the back of the silicon substrate maintains a smooth surface;

[0042] Step 2, immerse the silicon substrate with a rough structure on the front side into an acid etching solution. After this etching treatment, the front side of the silicon crystal substrate has a rough suede struct...

Embodiment 3

[0052] The invention provides a method for forming a textured structure on the front surface of a solar cell. The inventive method comprises the following processing steps:

[0053] Step 1, use silicon carbide (SiC) sand of 400 meshes with average grain size, under the pressure of 1.0Kg, the front side of silicon substrate carries out sandblasting treatment, removes some films on the front side of silicon substrate, for example, silicon nitride ( SiN) film, titanium nitride (TiN) film, silicon carbide (SiC) film. Through sandblasting, the defective silicon layer is exposed to the outside, and the front of the silicon substrate forms a rough surface with a roughness greater than 0.3 μm, while the back of the silicon substrate maintains a smooth surface;

[0054] Step 2, immerse the silicon substrate with a rough structure on the front side into an acid etching solution. After this etching treatment, the front side of the silicon crystal substrate has a rough suede structure, w...

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PUM

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Abstract

This invention relates to a method for forming flannel surface structure on the positive of a solar energy cell including: 1, blasting the positive of a silicon chip with SiC sand to remove some films such as SiN, TiN and SiC films on the positive of the silicon chip to expose bug Si layer, and rough surface is formed on the positive of the Si chip with the roughness greater than 0.3 mum and the back keeps smooth, 2, dipping the Si chip with rough surface at the positive into an acid erosion solution, the chip processed by acid has rough surface and the back becomes smooth, 3, cleaning.

Description

technical field [0001] The invention relates to a manufacturing method of a solar cell, in particular to a method for forming a textured structure of a silicon substrate of a solar cell. Background technique [0002] Silicon solar cells use silicon wafers as substrates, and the front side of the solar cell faces sunlight, is irradiated by sunlight, absorbs sunlight, and converts sunlight energy into electrical energy. The electric energy converted by the front of the solar cell absorbing sunlight is collected through the output current of the positive and negative electrodes of the solar cell, and supplied to any equipment or device that needs electric energy. [0003] An important way to improve the photoelectric conversion efficiency of solar cells is to reduce the reflectivity of solar cells facing sunlight. Forming a rough suede structure on the front of the solar cell is an effective means to reduce the reflectivity. [0004] A general method for forming a textured st...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L31/18H01L21/302
CPCY02P70/50
Inventor 苏晓平江彤
Owner SEMICON MFG INT (SHANGHAI) CORP
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