Chemical supply system

Abstract

A chemical supply system comprises, as principal elements, a chemical storage tank in which a liquid chemical for cleaning is stored in the state of its formulated concentrate, a chemical supply apparatus connected to the chemical storage tank for positively performing chemical supply, a piping system connected to the chemical supply apparatus to form a supply flow passage that is a passage for ultrapure water which the liquid chemical is to be mixed with, a pair of discharge nozzles disposed at end portions of the piping system so as to oppose surfaces of a wafer set in a cleaning chamber to supply a cleaning liquid onto the surfaces. Thereby, remarkable miniaturization / simplification of a cleaning liquid supply system including chemical tanks is intended, it is made possible easily and rapidly to compound and supply a cleaning liquid at an accurate chemical concentration, and particles or the like being generated and mixing in a cleaning liquid, are suppressed to the extremity.

Description

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a chemical supply pump, a chemical supply apparatus, and a chemical supply system (a chemical supply method) for accurately supplying a desired quantity of a liquid chemical, in particular, it is suitable for applying to a substrate cleaning apparatus (a substrate cleaning method) for cleaning semiconductor wafers or the like. 2. Description of the Related Art Conventionally in a semiconductor wet process, used is a substrate cleaning apparatus for performing a process such as cleaning with a cleaning liquid of ultrapure water and a liquid chemical. As such a substrate cleaning apparatus, remarked is a substrate single wafer spin cleaning apparatus in which substrates are loaded one by one and a cleaning liquid is supplied with rotating the substrate in a circumferential direction. In a conventional substrate cleaning apparatus, it was indispensable to provide a plurality of large-sized clean...

AI Technical Summary

Benefits of technology

"The present invention provides a chemical supply system that can easily and rapidly supply a cleaning liquid with a desired concentration. The system includes a chemical supply pump and a connecting flow passage that allows for the mixing of a liquid chemical with a solvent. The chemical supply pump has a compact member with non-permeability and a high anti-corrosion property that is made into a movable wall, which is oscillated in a direction perpendicular to its wall surface by a shaker to change the volume of the flow passage periodically. This allows for the accurate and rapid supply of a cleaning liquid with a desired concentration. The system also includes a chemical supply apparatus that discharges the liquid chemical from a tubule member directly connected to the supply flow passage, which is connected to a supply flow passage that is a passage for a solvent with which the liquid chemical is mixed. The system can suppress the generation of particles and the mixing of liquids in the cleaning liquid, and can easily and rapidly clean a substrate."

Problems solved by technology

Accordingly, the whole system becomes a very large scale and complex inevitably in this case.

Further, generation of particles and (metal) contamination from various liquid-contact portion caused by complication of the substrate cleaning apparatus is in question.

In this manner, at present, it is difficult to avoid increases in scale and complication of the whole apparatus attendant upon an increase in cleaning speed of substrate cleaning apparatus.

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