Apparatus including 4-way valve for fabricating semiconductor device, method of controlling valve, and method of fabricating semiconductor device using the apparatus

a technology of apparatus and semiconductor, applied in the direction of transportation and packaging, chemical vapor deposition coating, coating, etc., can solve the problems of slow deposition of ald, dead volume (dv), and inability to purge, so as to increase the purge efficiency
US20060156980A1Inactive Publication Date: 2006-07-20SAMSUNG ELECTRONICS CO LTD +1
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Patent Information

Authority / Receiving Office
US · United States
Patent Type
Applications(United States)
Current Assignee / Owner
SAMSUNG ELECTRONICS CO LTD
Publication Date
2006-07-20
Estimated Expiration
Not applicable · inactive patent

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Abstract

An apparatus and method for fabricating a semiconductor device using a 4-way valve with improved purge efficiency by improving a gas valve system by preventing dead volume from occurring are provided. The apparatus includes a reaction chamber in which a substrate is processed to fabricate a semiconductor device; a first processing gas supply pipe supplying a first processing gas into the reaction chamber; a 4-way valve having a first inlet, a second inlet, a first outlet, and a second outlet and installed at the first processing gas supply pipe such that the first inlet and the first outlet are connected to the first processing gas supply pipe; a second processing gas supply pipe connected to the second inlet of the 4-way valve to supply a second processing gas; a bypass connected to the second outlet of the 4-way valve; and a gate valve installed at the bypass.
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Description

CROSS-REFERENCE TO RELATED PATENT APPLICATIONS

[0001] This application claims the benefit of Korean Patent Application No. 10-2005-0005074, filed on Jan. 19, 2005, and Korean Patent Application No. 10-2005-0076968, filed on Aug. 22, 2005, in the Korean Intellectual Property Office, the contents of which are incorporated herein in their entirety by reference. BACKGROUND OF THE INVENTION

[0002] 1. Field of the Invention

[0003] The present invention relates to an apparatus for fabricating a semiconductor device, and more particularly, to an apparatus for fabricating a semiconductor device using a 4-way valve with improved purge efficiency by improving a valve system for gas supplied to a reaction chamber, a method of controlling the 4-way valve, and a method of fabricating a semiconductor device using the apparatus.

[0004] 2. Description of the Related Art

[0005] Semiconductor devices are fabricated by repeatedly performing processes such as deposition and patterning of a thin layer on...

Claims

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