Inductively-coupled plasma source

a plasma source and inductive coupling technology, applied in glass making apparatus, instruments, manufacturing tools, etc., can solve the problems of reducing coupling efficiency, reducing the life of the vessel, and wasting rf power, so as to maximize gas excitation efficiency, maximize the life of the vessel, and efficiently couple energy to the plasma

Active Publication Date: 2008-06-19
MKS INSTR INC
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  • Abstract
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  • Claims
  • Application Information

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Benefits of technology

[0006]One discovery of the present invention is an electromagnetic configuration that can efficiently couple energy to a plasma and maximize gas excitation efficiency while maximizing the life of the vessel. In this electromagnetic configuration, plasmas can be generated in plasma vessels of relatively simple geometries by an induced electr

Problems solved by technology

However, electrostatic shields often reduce coupling efficiency between an induction coil and plasma, causing RF power to be wasted and impedance matching to become more difficult.
Conventional plasma sources can be expensiv

Method used

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Examples

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Embodiment Construction

[0038]is a partial schematic view of a gas excitation system 100 that generates excited gases, according to an illustrative embodiment of the invention. Plasmas are often used to activate gases, placing them in an excited state such that the gases have an enhanced reactivity. Excitation of a gas involves elevating the energy state of the gas. In some cases, the gases are excited to produce dissociated gases containing ions, free radicals, atoms and / or molecules. The system 100 includes a plasma vessel 111 and at least one magnetic core 104 with a gap 108. The vessel 111 is located at least partially within the gap 108 of the core 104. The system 100 also includes a power supply 101 electrically coupled to a primary winding 102 that surrounds a portion of the magnetic core 104. The power supply 101 provides a flow of electric current through the winding 102 that generates an alternating magnetic field 103 through the core 104. The magnetic field 103 passes through the core 104, unidi...

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Abstract

A method and apparatus for exciting gas that involves generating an alternating magnetic field unidirectionally through a magnetic core defining a gap, across the gap and through a plasma vessel that includes dielectric material. The magnetic field induces an electric field in the plasma vessel that generates the plasma.

Description

FIELD OF THE INVENTION[0001]The invention relates generally to methods and apparatus for generating plasma and exciting gases. More particularly, the invention relates to apparatus and methods for generating excited gases containing ions, free radicals, atoms and molecules and apparatus for and methods of processing materials with excited gases.BACKGROUND OF THE INVENTION[0002]Plasmas are often used to activate gases placing them in an excited state causing enhanced reactivity. The gases may be excited to produce dissociated gases containing ions, free radicals, atoms and molecules. Excited gases are used for numerous industrial and scientific applications, including processing solid materials such as semiconductor wafers and powders, other gases, and liquids. The parameters of the dissociated gas and conditions under which the dissociated gas interacts with a material to be processed by the system vary widely depending on the application. For example, atomic fluorine is used to etc...

Claims

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Application Information

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IPC IPC(8): H05H1/24
CPCH01J37/321H01J37/32522H05H1/46H05H1/24H01J37/3266C03B19/143C03B37/0183C03B37/01861H05H1/4652
Inventor CHEN, XING
Owner MKS INSTR INC
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