Apparatus for imprint lithography using an electric field

Abstract

A lithography process for creating patterns in an activating light curable liquid using electric fields followed by curing of the activating light curable liquid is described. The process involves the use of a template that is formed of non-conductive and electrically conductive portions. The template is brought into close proximity to the activating light curable liquid on the substrate. An external electric field is applied to the template-substrate interface while maintaining a uniform, carefully controlled gap between the template and substrate. This causes the activating light curable liquid to be attracted to the raised portions of the template. Activating light is applied to the curable liquid while an electric field is applied to the template to create a patterned layer on the substrate.

Description

CROSS-REFERENCE TO RELATED APPLICATIONS[0001]The present application is a divisional of U.S. patent application Ser. No. 10 / 194,410 filed on Jul. 11, 2002 entitled “Method for Imprint Lithography using an Electric Field,” which is incorporated by reference herein.BACKGROUND OF THE INVENTION[0002]1. Field of the Invention[0003]Embodiments presented herein relate to methods and systems for imprint lithography. More particularly, embodiments relate to methods and systems for micro- and nano-imprint lithography processes.[0004]2. Description of the Relevant Art[0005]Optical lithography techniques are currently used to make most microelectronic devices. However, it is believed that these methods are reaching their limits in resolution. Sub-micron scale lithography has been a critical process in the microelectronics industry. The use of sub-micron scale lithography allows manufacturers to meet the increased demand for smaller and more densely packed electronic circuits on chips. It is exp...

AI Technical Summary

Benefits of technology

This method enables the precise creation of sub-100 nm features on substrates with improved alignment accuracy and reduced operational costs, suitable for high-volume manufacturing of microelectronic devices and other applications like patterned magnetic media.

Problems solved by technology

However, it is believed that these methods are reaching their limits in resolution.

At these short wavelengths, many common materials are not optically transparent and therefore imaging systems typically have to be constructed using complicated reflective optics.

Furthermore, obtaining a light source that has sufficient output intensity at these wavelengths is difficult.

Such systems lead to extremely complicated equipment and processes that may be prohibitively expensive.

It is also believed that high-resolution e-beam lithography techniques, though very precise, are too slow for high-volume commercial applications.

Hot embossing techniques face several challenges: i) pressure greater than 10 MPa are typically required to imprint relief structures, ii) temperatures must be greater than the Tg of the polymer film, iii) patterns (in the substrate film) have been limited to isolation trenches or dense features similar to repeated lines and spaces.

Hot embossing is unsuited for printing isolated raised structures such as lines and dots.

This is because the highly viscous liquids resulting from increasing the temperature of the substrate films require extremely high pressures and long time durations to move the large volume of liquids needed to create isolated structures.

This pattern dependency makes hot embossing unattractive.

Also, high pressures and temperatures, thermal expansion, and material deformation generate severe technical challenges in the development of layer-to-layer alignment at the accuracies needed for device fabrication.

Such pattern placement distortions lead to problems in applications such as patterned magnetic media for storage applications.

The addressing of the patterned medium bit by the read-write head becomes very challenging unless the pattern placement distortions can be kept to a minimum.

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