Low refractive layer and Anti-reflective film comprising the same
a technology of anti-reflective film and low refractive layer, which is applied in the field of low refractive layer and anti-reflective film, can solve the problems of poor scratch resistance, high production cost, and degraded screen resolution, and achieve excellent optical properties, low reflectance, and high light transmittance.
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Preparation Example 1
Preparation of Hard Coating Film 1 (HD1)
[0124]A salt type of antistatic hard coating solution (manufactured by KYOEISHA Chemical Co., Ltd., solid content: 50 wt %, product name: LJD-1000) was coated onto triacetylcellulose film with #10 mayer bar and dried at 90° C. for one minute, followed by irradiation with ultraviolet light of 150 mJ / cm2 to prepare a hard coating film (HD1) having a thickness of 5 μm.
preparation example 2
Preparation of Hard Coating Film 2 (HD2)
[0125]30 g of pentaerythritol triacrylate, 2.5 g of high molecular weight copolymer (BEAMSET 371, Arakawa Corporation, Epoxy Acrylate, molecular weight: 40,000), 20 g of methyl ethyl ketone and 0.5 g of leveling agent (Tego wet 270) were uniformly mixed. Then, 2 g of acrylic-styrene copolymer (volume average particle size: 2 μm, manufactured by Sekisui Plastic) with a refractive index of 1.525 as a fine particle was added to the mixture to prepare a hard coating composition. The hard coating composition thus obtained was coated onto triacetylcellulose film with a #10 mayer bar and dried at 90° C. for one minute. The dried product was irradiated with ultraviolet light of 150 mJ / cm2 to prepare a hard coating film (HD2) having a thickness of 5 μm.
preparation example 3
Preparation of Polysilsesquioxane 1
[0126]36.57 g (0.156 mol) of isooctyltrimethoxy silane, 23.34 g (0.094 mol) of 3-methacryloxypropyl trimethoxysilane and 500 mL of methanol were added to a 1 L reactor equipped with a nitrogen gas inlet tube, a condenser and a stirrer, and stirred at room temperature for 10 minutes. Then, tetramethylammonium hydroxide (280 g, 0.77 mol, 25 wt % in methanol) was added thereto, and the reaction was carried out for 8 hours by raising the reactor temperature under a nitrogen atmosphere to 60° C. After completion of the reaction, 15 g of polyhedral oligomeric silsesquioxane (POSS) substituted by an isooctyl group and a methacryloxypropyl group was obtained through column chromatography and recrystallization. The confirmation result of GP Chromatography showed that the molar ratio of a methacryloxypropyl group to an isooctyl group (mole number of methacryloxypropyl group / mole number of isooctyl group) which is substituted at silicon of polysilsesquioxane ...
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