Coating device having coated transmitter coil

US20200123657A1Pending Publication Date: 2020-04-23AIXTRON AG

Patent Information

Authority / Receiving Office
US Β· United States
Current Assignee / Owner
AIXTRON AG
Publication Date
2020-04-23

Smart Images

  • Figure 1
    Figure 1
Patent Text Reader

Abstract

A device, for depositing a layer on a substrate by supplying one or more process gases to a process chamber, includes a susceptor and one or more transmitter coils. The susceptor bearing the substrate can be heated to a process temperature by means of an electromagnetic alternating field generated by the one or more transmitter coils. The one or more transmitter coils have a coating that consists of tin and nickel in order to provide a corrosion-resistant coating, which simultaneously has low emissivity and is therefore effective in the presence of chlorine compounds and moisture.
Need to check novelty before this filing date? Find Prior Art

Description

RELATED APPLICATIONS

[0001] This application is a National Stage under 35 USC 371 of and claims priority to International Application No. PCT / EP2018 / 067947, filed 3 Jul. 2018, which claims the priority benefit of DE Application No. 20 2017 104 061.5, filed 7 Jul. 2017.FIELD OF THE INVENTION

[0002] The invention relates to a device for depositing a layer on a substrate by supplying one or a plurality of process gases into a process chamber, in which a susceptor bearing the substrate can be heated to a process temperature by means of an electromagnetic alternating field generated by one or a plurality of transmitter coils, wherein the one or a plurality of transmitter coils have a coating.BACKGROUND

[0003] A device of this type is described in DE 10 2010 016 471 A1. A process chamber, in which a susceptor consisting of an electrically conductive material, on which a substrate rests, is located in a housing, which is sealed in a gas-tight manner relative to the environment. Reactive process ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More