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No-brush temperature measuring method and device with CVD system substrate

A temperature measuring device and brushless technology, which is applied in the direction of gaseous chemical plating, metal material coating process, coating, etc., can solve the problems of inconvenient measurement of substrate temperature and inability to measure dynamically, so as to prolong the trouble-free working cycle , Measurement can be monitored in real time to improve the effect of uniformity

Inactive Publication Date: 2009-08-05
海安常科技术转移中心有限公司
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Problems solved by technology

[0006] The purpose of the present invention is to solve the problem that the substrate temperature measurement is inconvenient or impossible to measure dynamically in the existing hot wire chemical vapor deposition (hot wire CVD) diamond film deposition system, and to invent a method that can continuously measure the temperature distribution of the substrate surface in real time. Method and device for measuring substrate temperature in CVD system based on crank-link mechanism

Method used

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  • No-brush temperature measuring method and device with CVD system substrate
  • No-brush temperature measuring method and device with CVD system substrate
  • No-brush temperature measuring method and device with CVD system substrate

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Embodiment Construction

[0030] The following structural drawings and embodiments further illustrate the present invention.

[0031] Such as figure 1 , 2 , 3 shown.

[0032] A brushless temperature measurement method for a CVD system substrate, comprising the following steps:

[0033] First, several thermoelectric sides are arranged radially and / or axially along the substrate table;

[0034] Secondly, the electrical signal measured by the thermocouple is led out of the vacuum chamber with the wire connected to it and sent to the electric control system for processing;

[0035] Third, connect the substrate workbench with a crank-link mechanism, and make it swing 90°-180°, 5-8 times per minute, driven by the crank-link mechanism to keep the temperature on the substrate workbench The field is in a uniform state, and the best diamond film deposition effect is obtained.

[0036] The specific device matched with the above method can be:

[0037] A brushless temperature measuring device for a CVD syste...

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Abstract

The present invention is no-brush temperature measuring method and device for measuring the temperature of CVD system substrate dynamically. The present invention has swinging, rather than rotating, substrate bench to ensure the homogeneity of temperature on substrate surface and facilitate temperature measurement with thermocouple, and modified no-brush thermocouple structure for real-time monitoring on the temperature of substrate surface.

Description

technical field [0001] The invention relates to a method and device for testing the substrate temperature field of a diamond film deposition system by hot wire chemical vapor deposition (hot wire CVD), especially a method and device capable of dynamically measuring the temperature field of a large-area substrate during the continuous swinging process of the substrate A method and device for radially and axially multi-point substrate temperature, specifically a method and device for measuring substrate temperature in a CVD system based on a crank linkage mechanism. Background technique [0002] At present, diamond is the hardest material known in nature. At the same time, it has extremely high thermal conductivity and sound transmission speed, high wear resistance and extremely low friction coefficient, and has become a new tool material with excellent performance. However, natural diamond is rare and extremely expensive. Chemical vapor deposition (CVD) is a new method of pre...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C16/52
Inventor 徐锋左敦稳郭魂卢文壮曾荡黎向锋
Owner 海安常科技术转移中心有限公司
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