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Method for measuring birefraction optical devices phase-delay quantity and fast axis direction and device

A phase delay and optical device technology, applied in the field of laser precision measurement, can solve problems such as poor measurement accuracy, and achieve the effects of simple measurement, doubled measurement accuracy, and simple reception.

Inactive Publication Date: 2009-08-19
北京市普锐科创科技有限责任公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0018] The present invention overcomes the disadvantages of poor measurement accuracy or measurement device error and principle error in the prior art, and proposes a method for measuring birefringence phase delay and fast axis direction by using dual-frequency lasers. The method is convenient and quick to measure. The result can be directly calculated by the calculation method of analytical expression, so it can not only double the measurement accuracy, eliminate device error and principle error, but also expand the measurement object to optical devices such as optical wedges and lenses

Method used

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  • Method for measuring birefraction optical devices phase-delay quantity and fast axis direction and device
  • Method for measuring birefraction optical devices phase-delay quantity and fast axis direction and device
  • Method for measuring birefraction optical devices phase-delay quantity and fast axis direction and device

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Embodiment 1

[0041] Measuring method principle of the present invention is as figure 2 As shown, 203 is a beam splitter, 201 and 202 are analyzers, 204 is a half-wave plate, 205 is a sample to be tested, 206 is a converging lens, and 207 is a plane mirror. The beam splitter 203 is a neutral non-polarizing beam splitter. The tested sample 205 has a certain birefringence characteristic, which is characterized by a phase retardation and a fast axis direction, the magnitude of the phase retardation is denoted as Δ, and the angle between the fast axis direction and the X axis is denoted as θ. The included angle between the fast axis direction and the X axis of the half wave plate 204 is denoted as . The incident light contains frequencies f 1 and f 2 The two linearly polarized components of , whose directions are parallel to the X-axis and Y-axis, respectively.

[0042] The orthogonal dual-frequency laser emitted by the laser is used as incident light and is divided into reflected light ...

Embodiment 2

[0053] image 3 It shows a schematic structural view of the measuring device adopting the first embodiment of the method of the present invention, including: a dual-frequency laser light source 301, a beam splitter 302, a rotary table 303, a half-wave plate 304 arranged on the rotary table 303, and a two-dimensional translation Stage 305, measured sample 306, converging lens 307 and plane mirror 308, reference analyzer 311 and reference photodetector 312, measurement analyzer 310 and measurement photodetector 309 respectively arranged on both sides of spectroscope 302, A phase measurer 313 connected to the two photodetectors, a controller 314 connected to the rotating stage and a translation stage, and a computer 315 connected to the phase measurer and the controller.

[0054] In the dual-frequency laser light source, the emitted light contains two orthogonal linearly polarized light components of different frequencies, and the frequency difference between the two is tens of k...

Embodiment 3

[0070] See Figure 4 , is another embodiment of the method of the present invention. Compared with Embodiment 1, the difference is that the half-wave plate 404 is partially located in the optical path. In this embodiment, it is partially placed behind the beam splitter 403. Before, its effect was equivalent to changing the polarization angle of half of the beam of light, while the other half remained unchanged; a wedge-shaped reflector was added to divide the beam returned from the beam splitter 403 into two halves, which were the changed and unchanged polarization angles respectively. The two analyzers 401 and 409 are respectively placed in the light beams separated by the wedge mirror 408 . After the two half-beams of light pass through the polarizers 401 and 409 respectively, they are received to form two measurement beat frequency signals, which are compared with the reference beat frequency signals synthesized by the polarizer 402 to obtain two phase differences. This ca...

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Abstract

The method and device for measuring the phase delay of the birefringent optical device and the fast axis direction of the present invention can better solve the problem of poor measurement accuracy in the measurement process. The method is: a pair of orthogonal dual-frequency lasers emitted by the laser are split into Reflected light and transmitted light; one of the two paths of reflected light and transmitted light passes through the measurement point of the sample to be measured after changing the polarization angle, and then turns back and passes through the measurement point of the sample to be measured, so that the two frequencies in the beam The phase of the polarization component is delayed differently, causing a phase change; then the two paths of light are converted into a reference beat signal and a measurement beat signal with different phase differences after being synthesized by a polarizer; at least two phases are obtained difference, the phase delay of the measurement point and the direction of the fast axis can be calculated; the method and device of the invention make the measurement of the two parameters simple and eliminate the principle error and system error.

Description

technical field [0001] The invention belongs to the technical field of laser precision measurement, and in particular relates to the application of laser to measure the phase delay and fast axis direction of birefringent optical devices. Background technique [0002] The birefringence parameters of birefringent optical devices are important indicators to measure their performance, including phase retardation and its fast axis direction, which can be applied in residual stress detection of optical materials, photoelasticity measurement, phase retardation measurement of wave plates, materials And liquid crystal characteristics detection and many other aspects. [0003] At present, the existing detection methods include the quarter-wave plate method and the dual-frequency laser interferometry method. "Test Method for Colorless Optical Glass - Edge Stress Birefringence Test Method GB7962.6-87" is based on quarter-wave plate measurement, using white light source, manual operatio...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01M11/02
Inventor 蒋弘吴健陈强华柳忠尧李睿颖
Owner 北京市普锐科创科技有限责任公司
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