Evaporation source device

An evaporation source and evaporation part technology, applied in vacuum evaporation plating, ion implantation plating, metal material coating process, etc., can solve the problems of sputtering, complicated operation, difficult to obtain large evaporation, etc., to achieve the finished product rate increase effect

Inactive Publication Date: 2010-02-03
FUTABA CORPORATION
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0020] Therefore, the purpose of the invention of the present application is to solve the defects of the existing sealed evaporation source device for the sealed evaporation source device, that is, to solve the problems of splashing, unstable evaporation, difficulty in obtaining large evaporation, and inability to Problems such as long-time evaporation and cumbersome operation of the crucible during preparation

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0074] figure 1 A cross-sectional view of the evaporation source device of Example 1 is shown.

[0075] The crucible is heated by resistance heating. The heating method may also adopt other heating methods such as electron bombardment.

[0076] The evaporation source device includes: a retention unit 21 for storing and retaining the melted and liquefied evaporation material; an evaporation unit 22 for heating the melted and liquefied evaporation material to a vaporizable temperature to evaporate it; and a sprayer for spraying steam to the substrate 61 Use opening 225.

[0077] The retention unit 21 includes a cylindrical heating element 211 capable of conducting electricity and a heating container 212 of an electrical insulator accommodated therein. figure 1 The structure of the retention portion 21 is based on the premise that the molten evaporating material 32 is a conductive substance, but when the fused evaporating material 32 is an electrical insulator, the cylindric...

Embodiment 2

[0092] figure 2 A cross-sectional view of the evaporation source device of Example 2 is shown.

[0093] exist figure 1 In the case of evaporative material 32, the descending speed of evaporative material 32 falling in cylindrical heating element 221 is determined by the viscosity and gravity of evaporative material 32, so when increasing the descending amount of evaporative material 32 in order to increase the amount of evaporation of evaporative material 32, Then, the lowering time until the evaporation material 32 is completely evaporated becomes longer. To prolong the lowering time, it is necessary to increase the height of the cylindrical heating element 221 . Therefore, in order to easily manufacture and operate the evaporation source device, it is required to prolong the lowering time of the evaporation material 32 without increasing the height of the cylindrical heating element 221 .

[0094] To meet this requirement, figure 2 The evaporation source device is pro...

Embodiment 3

[0100] image 3 express figure 2 An embodiment of the columnar body 224 for lowering.

[0101] image 3 Four surface shapes of the lowering column are shown. The descending columnar body changes the descending speed and wetted area (diffusion area) of the molten evaporation material according to the surface shape.

[0102] image 3 The drop of (a) forms small irregularities on the surface with a columnar body or forms the surface in a pear-like shape, image 3 (b) The columns for lowering form spiral grooves on the surface, image 3 (c) The lowering columnar body forms a horizontal annular groove on the surface, image 3 The columnar body for lowering (d) has grooves in the vertical direction (axial direction of the columnar body for lowering) formed on the surface.

[0103] pass image 3 The surfaces of the lowering columns (a) to (d) are uneven, so that the lowering speed of the evaporating material can be slowed down, and the effect of radiant heat on the evaporati...

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PUM

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Abstract

An evaporation source comprising a melting section (24), a storing section (21), an evaporating section (22), and a jetting section (23). When current is passed through tubular heaters (241, 211), they generate heat and a linear evaporation material (31) is melted. Molten evaporation material (32) moves from a heating container (242) to a heating container (212) and stays there. The evaporation material (32) in the heating container (212) descends from a descending opening (216) along a descending column (224). During the descending process, the evaporation material (32) is evaporated by radiation heat from a tubular heater (221). The vapor of the evaporation material (32) is jetted from a nozzle (232) toward a substrate (61). The tubular heaters (241, 211, 221, 231) are composed of graphite and generate heat when a voltage is applied between electrodes (213, 214), (214, 222), and (232, 233).

Description

technical field [0001] The present invention relates to an evaporation source device, which is an evaporation source device of a vacuum evaporation device that forms a film of a material that is vaporized (vaporized) after being melted by heating. In the sealed evaporation source device, the opening has a size capable of maintaining the vapor injection phenomenon through the internal and external pressure difference of the crucible of the evaporation source device. Background technique [0002] pass Figure 17 , Figure 18 A conventional vacuum evaporation device and a sealed evaporation source device (hereinafter simply referred to as an evaporation source device) will be described (for example, refer to Patent Document 1). [0003] Figure 17 Shows the outline of the vacuum deposition device, Figure 18 Indicates the structure of the evaporation source device. Figure 17 , Figure 18 are cross-sectional views, respectively. Also for Figure 17 , Figure 18 Use the sam...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/24
CPCC23C14/24C23C14/243C23C14/246
Inventor 福田辰男
Owner FUTABA CORPORATION
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