Preparing method for mesoporous silicon dioxide material

A mesoporous silica and mesoporous structure technology, applied in the direction of silica, silicon oxide, etc., to achieve the effect of reducing production costs and reducing corrosion of production equipment

Inactive Publication Date: 2007-08-15
NANKAI UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, there is no report on the synthesis of mesoporous materials at room temperature and neutral conditions using catio

Method used

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  • Preparing method for mesoporous silicon dioxide material
  • Preparing method for mesoporous silicon dioxide material
  • Preparing method for mesoporous silicon dioxide material

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0024] According to the ratio: 0.2CTAB: 1TEOS: 0.5NaNO 3 : 100H 2 O Add 7.3 g of CTAB, 180 mL of deionized water and 4.25 g of NaNO to the reactor in sequence 3 , stirred until completely dissolved into a transparent solution, at this time the viscosity of the solution is very high. 20.8 g of TEOS was added to the solution, pH = 6, left to react at room temperature for 6 days, and a white mixture was obtained. Filter, wash and dry to obtain a white product. After the product is dried, it is baked at 540°C for 6 hours to remove the templating agent. The XRD pattern of the sample after calcination is shown in Figure 1, and Figure 1 is the powder X-ray diffraction pattern (XRD) of Example 1, which is consistent with the reported mesoporous materials with wormholes. The d value of the mesoporous structure was calculated to be 4.93 nm. The nitrogen adsorption isotherm and the pore size distribution of the sample after roasting are shown in Fig. 2, and Fig. 2 is the nitrogen ad...

Embodiment 2

[0026] According to the ratio: 0.2CTAB: 1TEOS: 0.15NaNO 3 : 100H 2 O 7.3 g of CTAB, 180 mL of deionized water and 1.27 g of NaNO were sequentially added to the reactor 3 , stirred until completely dissolved into a viscous transparent solution. 20.8 g of TEOS was added to this solution, pH = 6, stirred at room temperature for 6 days, and a white mixture was obtained. Filter, wash and dry to obtain a white product. The nitrogen adsorption isotherm and pore size distribution of the product after roasting are shown in Figure 3. The most visible pore size is 3.0nm, and the specific surface area is 541m 2 / g.

Embodiment 3

[0028] According to the ratio: 0.2CTAB: 1TEOS: 0.5Al(NO 3 ) 3 : 100H 2 O sequentially add 7.3g CTAB, 180mL deionized water and 18.8g Al(NO 3 ) 3 , stirred until completely dissolved into a transparent solution, at this time the viscosity of the solution is very high. 20.8 g of TEOS was added to this solution, and the reaction was allowed to stand at room temperature for 3 days to obtain a white mixture. Filter, wash and dry to obtain a white product. The XRD pattern of the product before and after firing is shown in Figure 4, (a) is the XRD pattern of the unroasted product, and (b) is the XRD pattern of the fired product.

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Abstract

The invention discloses a making method of dielectric-pore silica, which is characterized by the following: adopting organic siloxane as silicon source and nitrate as hydrolytic condensed catalyst of organic siloxane; synthesizing in the CTAB-TEOS-MNO3-H2O under indoor temperature; obtaining the product with IV-typed curve and specific surface area at 500-1600m2/g and most probable aperture at 2-4nm; fitting for macromolecular original covering and original fixed-carrying domain.

Description

Technical field: [0001] The present invention relates to a kind of preparation method of mesoporous silicon dioxide material, specifically a kind of under mild (room temperature and neutral) condition, adopt cationic surfactant as template, take nitrate as organosilicon source hydrolytic polymerization Catalysts for preparing mesoporous materials. Background technique: [0002] Since mesoporous silica materials were successfully synthesized in the 1990s (Nature, 359, 710, 1992), due to the wide application prospects of this material in many aspects (Chem. Rev., 97, 2373, 1997), it has become more and more popular It has attracted people's attention and has become a hot spot in material science research. Its preparation method is usually under acidic or alkaline conditions, using cationic surfactants, anionic surfactants or aggregates of nonionic surfactants as templates, and condensing through silicon-oxygen bonds. [0003] Chinese patent CN1579935A discloses a preparation...

Claims

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Application Information

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IPC IPC(8): C01B33/18
Inventor 陈铁红肖强丁大同
Owner NANKAI UNIV
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