Method and device for preparing dielectric film of BaTiO3 doping metallic ion
A technology of metal ions and dielectric films, applied in the field of preparation of dielectric films BaTiO3 doped with metal ions, can solve the problems of high cost and complex process, and achieve the effect of improving performance, process and simple structure
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Embodiment 1
[0021] The concentration is 0.1mol / L Ba(OH) 2 The solution is used as the electrolyte solution 4, stirred at a stirring speed of 120 rpm for 5 minutes, and a DC pulse voltage is applied between the anode 5 and the cathode 8, and the surface of the anode Ti is formed into a plasma discharge, and the discharge time is 10 to 20 minutes. The anode 5 BaTiO with a thickness of 10-15 μm is formed on the surface 3 film layer.
Embodiment 2
[0023] The concentration is 0.1mol / L Ba(OH) 2 Add 10g / L Ca(OH) to the solution 2 , prepare electrolyte solution 4, stir at a stirring speed of 120 rpm for 5 minutes, apply a DC pulse voltage between the anode 5 and the cathode 8, the surface of the anode Ti forms a plasma discharge, and the discharge time is 10 to 20 minutes. (Ba, Ca)TiO with a thickness of 15-20 μm is formed on the surface 3 film layer.
Embodiment 3
[0025] The concentration is 0.1mol / L Ba(OH) 2 Add 10g / L Na to the solution 2 SnO 3 , prepare electrolyte solution 4, stir at a stirring speed of 120 rpm for 5 minutes, apply a DC pulse voltage between the anode 5 and the cathode 8, the surface of the anode Ti forms a plasma discharge, and the discharge time is 10 to 20 minutes. (Ba, Sn)TiO with a thickness of 15-20 μm is formed on the surface 3 film layer.
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