Self-lubricating abrasion-proof graphite//TiC gradient composite thin film
A composite film, self-lubricating technology, used in ion implantation plating, coating, layered products, etc., can solve the problem of mechanical control system reliability and service life reduction, sharp increase in vacuum environment, tribological stability Excellent and other problems, to achieve the effects of excellent chemical stability, improved interfacial adhesion, and excellent friction stability
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Embodiment 1
[0012] A closed-field unbalanced magnetron sputtering apparatus was used to sputter and deposit a gradient composite film. A high-purity graphite target and a metal Ti target are placed on four vertical to the horizontal and 90 degrees to each other to prepare a thin film by reactive sputtering. The No. 1 and No. 3 targets are graphite targets, and the No. 2 and No. 4 targets are Ti targets. The turret table on which the alloy specimen is placed rotates in a single axis around the vertical center, and the rotation speed of the turret table is controlled to 4 rpm. The specimen rotates at the same time, and the distance between the specimen and the target is 15cm. Before coating, pre-evacuate to 3.0×10 -4 Pa, followed by argon with a purity of 99.99%, and the flow of argon is controlled at 35 sccm. First, clean the target material with 0.4A target current and 500V bias voltage for 20 minutes, then apply 4.0A target current and 110V sputtering bias on the two graphite targets respect...
Embodiment 2
[0015] A closed-field unbalanced magnetron sputtering apparatus was used to sputter and deposit a gradient composite film. A high-purity graphite target and a metal Ti target are placed on four vertical to the horizontal and 90 degrees to each other to prepare a thin film by reactive sputtering. The No. 1 and No. 3 targets are graphite targets, and the No. 2 and No. 4 targets are Ti targets. The turret table on which the alloy specimen is placed rotates in a single axis around the vertical center, and the rotation speed of the turret table is controlled to 4 rpm. The specimen rotates at the same time, and the distance between the specimen and the target is 15cm. Before coating, pre-evacuate to 3.0×10 -4 Pa, followed by argon with a purity of 99.99%, and the flow of argon is controlled at 35 sccm. First, clean the target material with 0.4A target current and 500V bias voltage for 20 minutes, then apply 4.0A target current and 90V sputtering bias on the two graphite targets respecti...
Embodiment 3
[0018] A closed-field unbalanced magnetron sputtering apparatus was used to sputter and deposit a gradient composite film. A high-purity graphite target and a metal Ti target are placed on four vertical to the horizontal and 90 degrees to each other to prepare a thin film by reactive sputtering. The No. 1 and No. 3 targets are graphite targets, and the No. 2 and No. 4 targets are Ti targets. The turret table on which the alloy specimen is placed rotates in a single axis around the vertical center, and the rotation speed of the turret table is controlled to 4 rpm. The specimen rotates at the same time, and the distance between the specimen and the target is 15cm. Before coating, pre-evacuate to 3.0×10 -4 Pa, followed by argon with a purity of 99.99%, and the flow of argon is controlled at 35 sccm. First, clean the target material with 0.4A target current and 500V bias voltage for 20 minutes, then apply 4.0A target current and 70V sputtering bias on the two graphite targets respecti...
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Abstract
Description
Claims
Application Information
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