Silicone hydride waste gas processing equipment

A technology for waste gas treatment and waste gas, which is applied to the separation of dispersed particles, chemical instruments and methods, separation methods, etc., can solve the problems that are not suitable for low-cost and large-scale production, and achieve the effect of low price, low production and easy operation
CN101244359AInactive Publication Date: 2008-08-20BEIJING XINGZHE MULTIMEDIA TECH
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Patent Information

Authority / Receiving Office
CN · China
Current Assignee / Owner
BEIJING XINGZHE MULTIMEDIA TECH
Publication Date
2008-08-20
Estimated Expiration
Not applicable · inactive patent

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Abstract

The invention discloses a novel silane waste gas processing equipment and method, which is suitable in large-scale semiconductor device production process. The processing system comprises a high temperature stainless steel tube which is filled with gravel. The silane waste gas exhausted from the film processing equipment is introduced into the high temperature stainless steel tube; then the silane is pyrolyzed and the decomposition products are deposited on the gravel; the gravel need periodic replacement. The silane waste gas processing equipment has the advantages of inimitable low cost, efficient and reliable treatment for waste gas the generated in vacuum deposition system.
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Description

technical field

[0001] The present invention describes equipment for the treatment of waste gases from semiconductor production processes, and in particular to a treatment of silane (SiH 4 ) waste gas treatment equipment and methods. Background technique

[0002] Vacuum processing equipment is widely used in large-scale manufacturing of silicon-based semiconductor device processes, such as integrated circuits and solar cells, including large-area photovoltaic cell components based on silicon thin films. CVD (Chemical Vapor Deposition) and Chemical Vapor Etching are currently more popular technical means for making the products referred to. For example, polysilicon or silicon dioxide layers in integrated circuits can be 4 Gas or other similar gases are deposited by CVD. In another example, silanes are used in plasma-enhanced chemical vapor deposition (PECVD) processes to produce thin-film solar cells based on hydrogenated amorphous and nanocrystalline silicon. After the C...

Claims

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