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A Method for Real-time Monitoring of Exposure in Fabrication of Holographic Grating

A holographic grating and real-time monitoring technology, applied in the spectrum field, can solve problems such as difficult reception of photomultiplier tubes and excessive background light

Inactive Publication Date: 2011-11-30
CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The method is based on the latent image self-diffraction of the holographic interferometry system I r2 and I l1 A collimating lens is added in the direction of propagation, and a photomultiplier tube is placed on the focal plane to detect the energy of the concentrated light, and then the signal is transmitted to the recorder to realize real-time self-monitoring of the latent image. In this method, The recording light is irradiated on the latent image grating as monitoring light, and the photomultiplier tube is used to receive the diffracted light for real-time monitoring. Since the diffracted light energy of the latent image grating is very weak, there is stray light originating from the recording light in the optical path, and this part of the stray light energy The energy of the diffracted light of the latent image grating is stronger than that of the latent image grating, which causes the background light to be too strong, so it is very difficult for the photomultiplier tube to receive the diffracted light of the latent image grating

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  • A Method for Real-time Monitoring of Exposure in Fabrication of Holographic Grating

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Embodiment Construction

[0012] The present invention is implemented according to the method of step 1, step 2, step 3 and step 4 set in the technical solution, wherein the recording laser 11 in step 1 adopts a krypton ion laser with a wavelength of 413.1nm, and the plane mirror 12 is a glass substrate Aluminum-coated reflector, spatial filter 13 is composed of microscopic objective lens and pinhole, collimator reflector 14 adopts K9 glass substrate with aluminized film, aperture is φ320mm, focal length f is 1200mm, first adjustment reflector 15 and second adjustment Reflector 16 is a K9 glass substrate aluminized reflector with a diameter of 160 mm × 110 mm. The grating substrate 20 is made of K9 optical glass, and the photoresist coated on the K9 optical glass is S1805 type produced by Japan Shipley Company , the monitoring laser 21 in the step 2 adopts He-Ne laser, the wavelength is 632.8nm, the latent image grating 22 is formed after being exposed to the photoresist that is coated on the grating su...

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Abstract

The invention discloses a method for real-time monitoring of exposure in the production of holographic gratings, which belongs to the method of real-time monitoring of exposure in the production of holographic gratings in the field of spectrum technology. The technical problem to be solved is to provide a method for real-time monitoring of exposure in the manufacture of holographic gratings. The technical solution is step 1, equipped with a set of holographic grating exposure device; step 2, equipped with a set of real-time monitoring device for precise control of holographic grating exposure; step 3, preparation of latent image grating and real-time monitoring of exposure; step 4, determining Exposure cutoff. The present invention introduces real-time monitoring technology in the exposure process to determine the exposure cut-off point is a simple and effective means. Using the exposure real-time monitoring device can quickly and accurately control the exposure amount of the holographic grating, and then accurately determine the best exposure cut-off point. The holographic grating exposure process provides scientific theoretical guidance and experimental basis.

Description

technical field [0001] The invention belongs to the field of spectrum technology and relates to a method for real-time monitoring of exposure in the manufacture of holographic gratings. Background technique [0002] In the holographic grating manufacturing process, the exposure amount is one of the important process parameters that need to be controlled. Underexposure or overexposure cannot obtain an ideal grating groove shape. The traditional method is to use a fixed exposure time, make a large number of samples, repeatedly correct the exposure amount, summarize the best process parameters, and then use the experience value for subsequent exposure. Because there are many process conditions that affect the quality of holographic gratings, this research method requires a large amount of experimental work and a long cycle, and ultimately no good quality holographic gratings can be obtained. The closest prior art with the present invention is that Chinese Patent No. CN1450426 ...

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03H1/04G03F7/00G02B7/182
Inventor 李文昊巴音贺希格齐向东唐玉国孔鹏
Owner CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI