Near-infrared single photon detector
A single photon detector and detector technology, applied in semiconductor devices, electrical components, circuits, etc., can solve problems such as large noise, complex process, and low repeatability
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[0028] Combine below figure 1 The details of the near-infrared single photon detector according to the embodiment of the present invention are described in detail.
[0029] A substrate 11, which is used for epitaxial growth of the materials of each layer of the detector;
[0030] The buffer layer 12, which is fabricated on the substrate 11, is a non-doped n-type InP material. Its purpose is to form a high-quality epitaxial surface, reduce the stress between the substrate and other layers, eliminate the propagation of substrate defects to other layers, and facilitate the growth of other layers of the device;
[0031] The N-type ohmic contact layer 13, which is made on the buffer layer 12, is heavily doped N-type InAlAs, and its purpose is to achieve a good ohmic contact. The heavy doping is used to reduce the series resistance. Improve the conversion efficiency of the device;
[0032] Superlattice multiplication layer 14, this superlattice multiplication layer is made on the...
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