Preparation of fullerene-like carbon film

A fullerene carbon film and type technology, applied in the direction of ion implantation plating, coating, metal material coating process, etc., can solve the problems of low friction performance, limited use range, high deposition temperature, and achieve low friction performance, Low friction coefficient, solving the effect of high deposition temperature

Inactive Publication Date: 2009-07-01
LANZHOU INST OF CHEM PHYSICS CHINESE ACAD OF SCI
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Problems solved by technology

[0005] The present invention combines high-energy particle bombardment and magnetron sputtering to reduce the energy required to form a fullerene-like structure in the deposition process, thereby solving the problems of high deposition temperature and high usage in the traditional fullerene-like carbon film preparation process. A limited range of problems, fabricating fullerene-like carbon films with high elasticity and low friction properties on metallic substrates

Method used

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Embodiment 1

[0012] The invention prepares the fullerene-like carbon film on the surface of the stainless steel or the titanium alloy, and the workpiece adopts a conventional pre-plating pretreatment process. The target material used is: a graphite target with a purity of 99.999%, which is made by cold-pressing graphite powder. The deposition gas is: 99.9% high-purity Ar gas and CH 4 Gas, the deposition pressure is 0.5Pa. Using magnetron sputtering, sputter a layer of metal Cr bonding layer with a thickness of 100nm on the metal substrate in the Ar gas environment; secondly, using the method of combining high pulse bias and magnetron sputtering, at -1000V Under pulse bias, Ar and CH 4 In the mixed gas, use argon and methane plasma to sputter the carbon target, in which the flow rate of Ar gas is kept at 120Sccm, CH 4 The gas flow rate is 120Sccm; a 500nm fullerene-like carbon film layer is deposited on the bonding layer, the sputtering voltage is 560V, and the current is 2.5A. By depos...

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Abstract

The invention discloses a method for preparing a fullerene-like carbon film with high elasticity and low friction. The invention adopts a composite vapor phase deposition system and utilizes the method of combining the pulse high voltage bias and the magnetron sputtering to prepare the film. The prepared fullerene-like carbon film has the atomic surface finish, low friction parameter, high hardness and good elastic restitution performance, so the film is suitable for lubricating high precision space motion parts and micro-electro-mechanical systems and can become an antifriction and abrasion resistant solid lubricating film with a long service life and low friction.

Description

technical field [0001] The invention relates to a preparation method of a high-elasticity and low-friction fullerene-like carbon film. Background technique [0002] In order to meet the special requirements on the surface of materials in the fields of aerospace, microelectronics, biology and medicine, solid lubricating films are developing in the direction of low friction, high hardness and long life. Using the latest advances in thin film science, surface modification and nanotechnology, through the selection of deposition methods and structural design, the development of new lubricating thin film materials with high elasticity and low friction in special environments and working conditions is important for the national high-tech field. development is of great significance. Compared with conventional solid lubricant films, amorphous carbon film has a series of excellent tribological properties. Amorphous carbon film has many different structural forms, such as graphite-lik...

Claims

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Application Information

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IPC IPC(8): C23C14/24C23C14/30C23C14/35
Inventor 王鹏张俊彦刘维民
Owner LANZHOU INST OF CHEM PHYSICS CHINESE ACAD OF SCI
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