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Apparatus for preparing CVD diamond film for linear sample

A technology for sample preparation and diamond film, applied in metal material coating process, gaseous chemical plating, coating and other directions, can solve problems such as low utilization rate of mixed gas, inability to generate uniform high-quality diamond film, etc., and achieve convenient replacement. , the effect of improving utilization and increasing growth rate

Inactive Publication Date: 2009-08-12
CENT SOUTH UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The technical problem to be solved by the present invention is to provide a device for preparing CVD diamond film from a linear sample, to overcome the low utilization rate of mixed gas in the existing equipment for preparing diamond film by hot wire chemical vapor deposition, and the inability to use it in other The problem of producing uniform high-quality diamond films on substrates such as rods, rods and shafts

Method used

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  • Apparatus for preparing CVD diamond film for linear sample
  • Apparatus for preparing CVD diamond film for linear sample
  • Apparatus for preparing CVD diamond film for linear sample

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Experimental program
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Embodiment 1

[0038] Such as figure 1 , figure 2 As shown, the device includes a gas collector 2, a substrate support frame 4, a displacement regulator 5, and a transmission device outside the vacuum equipment cavity, wherein the transmission device outside the vacuum equipment cavity consists of a stepping motor 6, a reduction box 7, a belt 8, The vacuum rotary valve 9 and the transmission flexible shaft 10 are formed. The gas collector 2 is a device made of stainless steel through bending and welding with a narrow slit ventilation cavity inside. The base supporting frame 4 is made of Mo, W, Ti or their alloys with high temperature resistance and small deformation coefficient. The displacement adjuster can precisely adjust the horizontal and vertical position of the linear base. The transmission device outside the chamber of the vacuum equipment is powered by the outside of the chamber, and the power is transmitted to the vacuum reaction chamber through the vacuum rotary valve 9, and ...

Embodiment 2

[0042] Embodiment 2: as image 3 As shown, the gas inlet device 16 and the gas collector 2 adopt the structure when they are arranged horizontally. The stratosphere evenly passes through multiple pieces of linear substrates 3 parallel to it, so that the reactant gas bundles are concentrated in a smaller area. The gas inlet device 16 and the gas collector 2 should be at a certain distance away from the fixed and movable support frames, so as to reduce the disturbance of the air flow field caused by the support frames blocking the flow direction of the air flow and the rotation of the gears. After the transmission system outside the vacuum chamber transmits power to the chamber, it connects the transmission flexible shaft 10 and drives the driving gear and the shaft 19 to rotate, so that the driven gear set 14 that meshes with each other drives the linear base 3 to rotate. The movable supporting frame 17 moves along the groove on the supporting plate 15, and the distance is adju...

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Abstract

The invention discloses a device for preparing a CVD diamond film through a linear sample. The device comprises a vacuum reaction chamber, a gas cracking hot wire, a gas expelling device and a basal body support used for placing a linear substrate, wherein the gas cracking hot wire, the gas expelling device and the basal body support are arranged inside the reaction chamber. The device is characterized in that: the gas expelling device is a gas collector with a narrow slit aeration cavity; the gas collector also has a V-shaped cross section; and the gas cracking hot wire, the linear substrate and an inlet of the gas collector are arranged in turn from top to bottom so as to achieve the aim of collecting gas within a smaller area which is matched with the gas cracking hot wire and the linear substrate to improve the proportion of cracked gas and the utilization ratio of the gas. The device makes an air flow field distributed in the form of the V-shaped cross section, thereby improving the utilization ratio of mixed gas and the growth rate of a diamond crystal, and ensuring that a diamond film evenly deposit on the surface of the substrate.

Description

technical field [0001] The invention relates to a device for preparing CVD (namely chemical vapor deposition) diamond film from a linear sample. Background technique [0002] Diamond has good physical and chemical properties, but the number of natural diamonds is scarce. The performance of artificial diamond film is basically close to that of natural diamond. It is a new material with excellent performance and has a wide range of applications. At present, it has been used in many occasions such as knives and high-performance electronic components. The preparation of diamond thin films has been industrialized. The hot wire chemical vapor deposition (HFCVD) diamond thin film preparation method is the main production method in the industrial CVD diamond thin film. , the operation is simple and convenient, and a diamond polycrystalline film with high quality and large area size can be obtained. The preparation of diamond film by HFCVD method is to mix the reaction gas and pass...

Claims

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Application Information

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IPC IPC(8): C23C16/27C23C16/44
Inventor 余志明魏秋平杨永青娄俊岭陈永勤黄登高孟泽
Owner CENT SOUTH UNIV
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