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Fluorine-containing compound, resin composition, photosensitive transfer material, separation wall, method for separation wall formation, color filter, method for manufacturing the color filter, and d

A technology of a resin composition and a manufacturing method, which is applied in the processing of photosensitive materials, photosensitive materials used in photomechanical equipment, optical filters, etc., can solve the problems of insufficient water repellency and oil repellency, insufficient developer resistance and adhesion, etc. Good adhesion, suppression of display unevenness, high water repellency and ink repellency

Inactive Publication Date: 2009-08-19
FUJIFILM CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0016] However, the water repellency and oil repellency of the composition composed of the blending ratio of the polymer described in Patent Document 1 and the composition containing the copolymer described in Patent Document 2 are insufficient.
In addition, the ethylene-based polymer described in Patent Document 3 is insufficient in developing solution resistance and adhesion during development.

Method used

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  • Fluorine-containing compound, resin composition, photosensitive transfer material, separation wall, method for separation wall formation, color filter, method for manufacturing the color filter, and d
  • Fluorine-containing compound, resin composition, photosensitive transfer material, separation wall, method for separation wall formation, color filter, method for manufacturing the color filter, and d
  • Fluorine-containing compound, resin composition, photosensitive transfer material, separation wall, method for separation wall formation, color filter, method for manufacturing the color filter, and d

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Embodiment 1

[0275] The following fluorine-containing compounds (1) to (10) as the above-mentioned fluorine-containing compounds of the present invention were synthesized as follows. Among them, other fluorine-containing compounds of the present invention other than the exemplified compounds synthesized here can also be synthesized by a similar method.

[0276] —Synthesis of fluorine-containing compound (1)—

[0277] Under nitrogen flow, add 50 g of propylene glycol monomethyl ether acetate [MMPG-Ac, manufactured by Daicel Chemical Industry Co., Ltd.] into a 300 ml three-necked flask equipped with a cooling tube, and use a water bath in which paraffin (paraffin) has been added. The internal temperature was heated to 70°C. Furthermore, using a plunger pump, 5.0 g of acrylic acid [AA, manufactured by Tokyo Chemical Industry Co., Ltd.] and 50 g of acrylic acid 2-(perfluorohexyl)-ethyl acetate dissolved in 80 g of MMPG-Ac were instilled therein for 2 hours, respectively. Base ester [FAAC6, m...

Embodiment 2

[0312] —Preparation of photosensitive resin composition—

[0313] The photosensitive resin composition K1 can be prepared as follows, that is: first, by measuring the K pigment dispersion 1 and propylene glycol monomethyl ether acetate in the amount recorded in the following Table 1, at a temperature of 24 ° C (± 2 ° C ), and stirred at 150 rpm for 10 minutes, then, measure the amount of methyl ethyl ketone, binder 2, hydroquinone monomethyl ether, DPHA liquid, 2,4-bis(trichloro Methyl)-6-[4'-(N, N-bisethoxycarbonylmethyl) amino-3'-bromophenyl]-s-triazine, surfactant 1 and the obtained The fluorine-containing compound (1) was added sequentially at a temperature of 25°C (±2°C), and stirred at 150 rpm for 30 minutes at a temperature of 40°C (±2°C).

[0314] At this time, the ratio of the fluorine-containing compound (1) to the solid content mass in the photosensitive resin composition K1 was 5%. In addition, the quantity described in Table 1 is a mass part, Specifically, it is...

Embodiment 3～4

[0426] In Example 2, except that the content of the fluorine-containing compound (1) was changed from 5.0% to 1.0% and 0.1%, respectively, it was carried out in the same manner as in Example 2, and the photosensitive resin composition K1 was prepared to produce a color filter Sheets and liquid crystal display devices were simultaneously evaluated in the same manner. The evaluation results are shown in Table 2 below.

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Abstract

This invention provides a fluorine-containing compound comprising a repeating unit having not less than seven fluorine atoms and a repeating unit having not less than three ester groups, and a resin composition and a photosensitive transfer material comprising the fluorine-containing compound. The resin composition and photosensitive transfer material are usable for the manufacture of color filters.

Description

technical field [0001] The present invention relates to a fluorine-containing compound, a resin composition using the same, a photosensitive transfer material, a separation wall and its forming method, a color filter and its manufacturing method, and a display device. Background technique [0002] In recent years, the demand for liquid crystal displays for personal computers and liquid crystal color televisions tends to increase, and improvement in characteristics and cost reduction of color filters indispensable to such displays are increasing. [0003] Conventionally, as a method of manufacturing a color filter, a dyeing method, a pigment dispersion method, an electrodeposition method, a printing method, and the like have been implemented. [0004] For example, the dyeing method is to form a water-soluble polymer material layer as a dyeing material on a transparent substrate, form it into a pattern of a desired shape by using a photolithography process, and then immerse th...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C08F220/24G02B5/20G03F7/004G03F7/033G03F7/40
CPCG03F7/033G03F7/0007C08F220/24G03F7/0046
Inventor 有冈大辅柏木大助
Owner FUJIFILM CORP
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