High-field asymmetric waveform ion mobility spectrometer with multi-layer plate structure
A waveform ion migration, high-field asymmetric technology, applied in the direction of instruments, scientific instruments, measuring devices, etc., can solve the problem of reducing the overall performance of the FAIMS system, the inability to completely separate acetone and toluene, and the inability to separately adjust the ion source and the carrier gas flow in the migration area Speed and other issues, to achieve the effect of improving the overall performance, easy integration, and miniaturization
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Embodiment 1
[0026] The mixture of acetone and toluene was detected by high-field asymmetric waveform ion mobility spectrometer with multi-layer plate structure. The sample carrier gas 1 carries the mixture of acetone and toluene into the vacuum ultraviolet lamp ion source. According to the ionization characteristics of the vacuum ultraviolet lamp, the flow rate of the sample carrier gas 1 was determined to be 1 L / min. A DC voltage of 7V is applied between the upper deflection electrode 4 and the lower deflection electrode 15 through the DC power supply 2, and the unionized acetone molecules and toluene molecules are purified and filtered by the molecular sieve purifier 9 under the action of the sample carrier gas 1 and discharged from the system, ionized The acetone ions and toluene ions move and deflect to enter the second gas channel 12 under the action of a DC voltage of 7V. The pure carrier gas 18 is 99.999% high-purity nitrogen, the gas flow rate is adjusted to 2.5L / min, and the ace...
Embodiment 2
[0028] The system integration of multi-layer plate structure high-field asymmetric waveform ion mobility spectrometer is carried out by using MEMS technology. The ion source 3 is a corona discharge ion source with a cylindrical structure, and the detection unit 10 is a microarray Faraday cage with a cylindrical structure. Both the ion source 3 and the detection unit 10 can be formed by etching a conductive silicon wafer through an ICP process. The upper substrate 7 , the intermediate substrate 17 and the lower substrate 20 are made of borosilicate glass, and the ion channel 16 in the intermediate substrate 17 is processed with a circular hole with a diameter of 3mm on the borosilicate glass through a precision machining process. The upper separation electrode 4, the lower separation electrode 15, the upper electrode 13 of the migration region, and the lower electrode 11 of the migration region on the substrate are formed by sputtering Ti / Pt / Au metal on borosilicate glass (thic...
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