Anti-glare film and method for manufacturing same
A manufacturing method and technology of coating solution, applied in the direction of layered products, coatings, etc., can solve the problems of layering phenomenon, affecting the yield of the preparation process, poor uniformity of coating film quality, etc., so as to avoid the problem of poor uniformity. Effect
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[0023] The preparation method of the zeolite solution comprises firstly preparing a solution capable of producing zeolite nanoparticles. A solution for producing zeolite nanoparticles includes a silica source, water, and a zeolite structure-directing agent (SDA). The silicon source may be, for example, selected from C1-C2 alkyl orthosilicates containing orthosilicate. The zeolite structure-directing molecule may be selected from the group comprising quaternary ammonium hydroxides and salts thereof. In a preferred embodiment, the aforementioned silicon source may be tetra ethyl orthosilicate, and the zeolite structure-directing molecule may be tetrapropylammonium hydroxide.
[0024] After the preparation of the solution that can produce zeolite nanoparticles is completed, the solution that can produce zeolite nanoparticles can be heated in an environment with a temperature of 60-100°C for 3-5 hours to carry out the step of heating and concentrating, and the silicon oxide in it...
preparation example 1
[0030] 【Preparation Example 1: Resin Solution】
[0031] The components of the resin solution include 2.34 grams of Chivacure 173 and 1.56 grams of Chivacure 184 UV initiators, 7.5 grams of Doublemer 87A (an oligomer containing six acrylic functional groups: Aliphaticurethane hexa-acrylate Oligomer), 5 grams of Doublemer 570 (containing The oligomer of two acrylic functional groups: Aliphatic urethane Oligomer), 18.7 grams of trimethylolpropane triacrylate monomer (trimethylol propane triacrylate, TMPTA) monomer, 0.63 gram of leveling agent 9011 (the above-mentioned chemicals are all produced by DBC company) and 62 g of MEK-ST sol (methyl ethyl ketone sol containing 30 wt% of nano-silica particles (particle diameter about 5-80 nm), manufactured by Nissan). Mix the above chemicals and stir with a magnet to form a homogeneous transparent resin solution.
preparation example 2
[0032] [Preparation Example 2: Zeolite Solution]
[0033] Take 7.08 g of 40% tetrapropylammonium hydroxide aqueous solution (Tetra-n-propylammonium hydroxide, manufactured by Alfa Aesar), add 11.58 g of tetraethoxysilane (Tetraethoxysilane, manufactured by Fluka) and 79.8 ml of deionized water. The reaction was stirred at room temperature for 45 minutes to obtain a clear solution. The zeolite solution is then completed by vacuum concentration at 80° C. to adjust the silicon dioxide content to about 32 wt % and heating at 80° C. for 30 hours. The zeolite solution contains 3.34 grams of zeolite and 4.4 grams of water.
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