Silicon material substrate and construction method thereof

A construction method and technology of silicon materials, applied in the direction of metal material coating technology, microstructure technology, microstructure devices, etc., to achieve the effects of easy acquisition, stable hydrophobic performance, and simple process operation

Inactive Publication Date: 2010-05-12
DALIAN MARITIME UNIVERSITY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, so far, there is no process that can prepare silicon material substrates with superhydrophobic properties.

Method used

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  • Silicon material substrate and construction method thereof
  • Silicon material substrate and construction method thereof
  • Silicon material substrate and construction method thereof

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Embodiment Construction

[0030] The present invention will be further described below in conjunction with the accompanying drawings. Such as Figure 1-5 As shown, a silicon material substrate includes a silicon substrate 1 , a texture layer 2 and a film-forming layer 3 , and the texture layer 2 is between the silicon substrate 1 and the film-forming layer 3 . The texture layer 2 is obtained by laser processing the surface of the silicon substrate 1 , and the film-forming layer 3 is obtained by forming a self-assembled molecular film on the texture layer 2 . The texture layer 2 has a micron-submicron surface texture structure. The texture structure is dot matrix texture, linear texture or grid texture. The self-assembled molecular film is 1H, 1H, 2H, 2H-perfluorooctyltrichlorosilane with a purity of 97%, FOTS for short.

[0031] Such as figure 2 Shown, a kind of construction method of the silicon material substrate with superhydrophobic property comprises the following steps:

[0032] A. Pretreat...

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Abstract

The invention discloses a silicon material substrate and a construction method thereof. The silicon material substrate comprises a silicon substrate, a texture layer and a film forming layer, wherein the texture layer is between the silicon layer and the film forming layer and has a micrometer-submicron grade surface texture structure which is dot matrix texture, straight line texture or grid texture. The construction method comprises the steps of obtaining the texture layer on the surface of the silicon substrate by laser processing and obtaining the film forming layer by the film formation of a self-assembly molecular film on the texture layer. In the invention, a laser method is adopted for processing the surface texture structure on the surface of the silicon substrate and a self-assembly technology is utilized for conducting film formation of the self-assembly molecular film on the laser-processed surface, thus leading the surface contact angle of the original hydrophilic silicon substrate to achieve about 160 degrees and allowing the silicon substrate to become to a silicon material substrate with super hydrophobicity. The technology has simple operation procedures, easily-obtained required chemical reagents, and relatively low cost; in addition, the hydrophobicity of the prepared silicon substrate is relatively stable.

Description

technical field [0001] The invention relates to a silicon material processing technology, in particular to a silicon material substrate and a construction method thereof. Background technique [0002] Silicon is a semiconductor material widely used in microelectronics / nanoelectromechanical systems. The superhydrophobic surface based on silicon materials can effectively control the wettability, adhesion, lubricity and wear properties of the surface layer, and has a wide range of applications. Application prospect. At present, there are two main processes for constructing superhydrophobic surfaces: one is to create a rough surface on the surface of hydrophobic materials; the other is to modify the surface of substrate materials with low surface energy substances. Generally speaking, materials with contact angles less than 90° are hydrophilic materials, and materials with contact angles greater than 90° are hydrophobic materials. However, the contact angles of the flat silico...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B81B7/02B81C1/00
Inventor 张会臣李杰庞连云
Owner DALIAN MARITIME UNIVERSITY
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