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Photoresist cleaning fluid composition and application thereof

A composition and cleaning solution technology, applied in optics, optical components, photosensitive material processing, etc., can solve the problems of limited solvent removal effect, dye back-staining, environmental pollution and other problems

Inactive Publication Date: 2010-06-16
ETHICAL INT WAREHOUSING TRADING SHANGHAI
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  • Abstract
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Problems solved by technology

However, when applied to the cleaning and removal of the above-mentioned color photoresist, the photoresist removal performance cannot be fully exerted, and a large amount of removal liquid must be used, which leads to the problem of waste liquid treatment of organic solvent removal liquid.
[0008] Only the solvent has limited removal effect and the situation of dye back staining will occur, and it will cause environmental pollution. Equipment is needed to suppress the volatilization of solvents
In addition, isopropanol, n-butanol, methyl isobutyl ketone, and acetone are flammable solvents with low flash points (<38°C), so there is a risk of fire, and explosion-proof devices must be installed to prevent danger from occurring. , so the expenditure on equipment must increase

Method used

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  • Photoresist cleaning fluid composition and application thereof
  • Photoresist cleaning fluid composition and application thereof
  • Photoresist cleaning fluid composition and application thereof

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Embodiment Construction

[0029] The invention is described in further detail using the following specific examples. The following examples have a more specific description of the implementation method of the present invention, but the scope of rights claimed by the present invention is not limited to the following examples. Portions not otherwise marked are by weight.

[0030] The cleaning solution composition of the present invention is used as a material to form an image after the color photoresist is exposed. The composition and usage amount of the color photoresist are shown in the following table:

[0031]

[0032] Formation of color photoresist film

[0033] A uniform photoresist film can be obtained by mixing the above-mentioned components with a stirrer and coating the solution on the alkali-free glass substrate on which a pattern-shaped light-shielding layer of 20 microns x 20 microns has been formed, and then spin-coating. Into a vacuum oven at room temperature for 5 minutes of solvent ex...

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Abstract

The invention relates to a photoresist cleaning fluid composition and an application thereof, wherein the photoresist cleaning fluid composition comprises (a) water, (b) quaternary ammonium hydroxide salt compound, (c) alcamine compound and (d) a non-ionic interfacial active agent as a compound in formula (I), wherein the definitions of n and m are shown in the description. The photoresist cleaning fluid of the invention is suitable for the photoresist of an uncured light sensitive composition, and is especially suitable for the application of the cleaning fluid for removing the uncured light sensitive composition of a color filter.

Description

technical field [0001] The present invention relates to a photoresist cleaning solution composition and its application, which can be used in the process of spin-coating photoresist, and is applied to the uncured photosensitive composition attached to the peripheral part, edge part or inner part of the substrate. The removal of cloth film, or the cleaning solution for the removal of uncured radiation-sensitive composition attached to the surface of device components or utensils, such as color filter (CF), liquid crystal display (LCD) or printed circuit board (PCB) field. [0002] It is especially suitable for use as a cleaning solution for removing the uncured photosensitive composition of color filters. Background technique [0003] Generally, in the process of liquid crystal, organic EL, plasma display and other flat-panel displays or semiconductors and printed circuit boards, in order to obtain fine images, the general photolithography technology is used to form the phot...

Claims

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Application Information

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IPC IPC(8): G03F7/42G02B5/23
Inventor 刘大铭李晏成周德纲
Owner ETHICAL INT WAREHOUSING TRADING SHANGHAI
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