p-i-n type InGaN quantum dot solar battery structure and manufacture method thereof
A p-i-n and solar cell technology, applied in circuits, photovoltaic power generation, electrical components, etc., can solve the problems of not fully showing the advantages of quantum dot cells and unsatisfactory cell characteristics, so as to improve photoelectric conversion efficiency and avoid dopants Diffusion, high-quality effects
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[0042] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with specific embodiments and with reference to the accompanying drawings.
[0043] The key of the present invention is to combine indium gallium nitride (In x Ga 1-x N) The unique advantages of ternary alloy materials and quantum dot structure, through strict control of growth conditions, such as growth temperature, growth pressure and growth thickness, high-quality In y Ga 1-y N quantum dots for the i layer and In x Ga 1-x N is the p-i-n structure of the potential barrier layer, so that the limit conversion efficiency of 63% can be theoretically achieved.
[0044] The present invention adopts novel In x Ga 1-x N ternary alloy semiconductor material, its structure and fabrication method can be applied to In x Ga 1-x Fabrication of N-series quantum dot high-efficiency solar cells.
[0045...
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