Method for preparing light absorption layer of CIGS (copper indium gallium selenide) thin film solar cell by magnetron sputtering method
A thin-film solar cell, light-absorbing layer technology, applied in sputtering, coating, circuit, etc., can solve the problems of large difference, variation, difficult to control film uniformity and repeatability, etc., to achieve high film quality and process. Simple, avoids volatilization effect
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Embodiment 1
[0042] Preparation of CIGS precursor thin film: on molybdenum-coated soda lime silica glass, with Cu 0.9 In 0.8 Ga 0.2 Se 1.95 As a target, the CIGS precursor film was prepared by radio frequency sputtering, and the sputtering power density was 1.2Wcm -2 , the target distance is 7cm, the working pressure is 1.2Pa; the thickness of the prepared CIGS precursor film is 1200nm, due to the difference of element sputtering rate, in the prepared CIGS precursor film Cu / (In+Ga)=0.86, Ga / (In+Ga) = 0.20.
[0043] Heat treatment of CIGS precursor film: In 30000Pa nitrogen, the solid elemental Se source was heated to 230°C to form the saturated vapor pressure of Se, the CIGS precursor film was placed in the saturated Se vapor pressure, and the CIGS The precursor film is heated to 530° C. and kept for 30 minutes to prepare the desired CIGS light-absorbing layer.
Embodiment 2
[0045] Preparation of CIGS precursor film: on a molybdenum-coated ceramic plate, with Cu 0.7 In 0.6 Ga 0.4 Se 1.85 As a target, the CIGS precursor film was prepared by radio frequency sputtering, and the sputtering power density was 0.2Wcm -2 , the target distance is 4cm, the working pressure is 0.05Pa; the thickness of the prepared CIGS precursor film is 500nm, due to the difference of element sputtering rate, in the prepared CIGS precursor film, Cu / (In+Ga)=0.67, Ga / (In+Ga) = 0.40.
[0046] Heat treatment of CIGS precursor film: In 100000Pa nitrogen, heat the solid elemental Se source to 180°C to form the saturated vapor pressure of Se, place the CIGS precursor film in the saturated Se vapor pressure, and heat the CIGS at a heating rate of 10°C / min. The precursor film is heated to 450° C. and kept for 60 minutes to prepare the desired CIGS light-absorbing layer.
Embodiment 3
[0048] Preparation of CIGS precursor film: on molybdenum-coated stainless steel foil, with Cu 0.5 In 0.3 Ga 0.7 Se 1.75 As a target, the CIGS precursor film was prepared by radio frequency sputtering, and the sputtering power density was 3.0Wcm -2 , the target distance is 10cm, the working pressure is 5Pa; the thickness of the prepared CIGS precursor film is 1500nm, due to the difference of element sputtering rate, in the prepared CIGS precursor film, Cu / (In+Ga)=0.49, Ga / ( In+Ga) = 0.70.
[0049] Heat treatment of CIGS precursor film: In 10000Pa nitrogen, heat the solid elemental Se source to 350°C to form the saturated vapor pressure of Se, place the CIGS precursor film in the saturated Se vapor pressure, and heat the CIGS at a heating rate of 50°C / min. The precursor film is heated to 500° C. and kept for 30 minutes to prepare the desired CIGS light-absorbing layer.
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