Developer solution for positive lithoprinting plate

A technology of developing solution and lithography, applied in the field of developing solution

Inactive Publication Date: 2010-07-07
LUCKY HUAGUANG GRAPHICS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0007] The object of the present invention is to provide a kind of developing solution that is suitable for positive-working lithographic plate material, and this developing solution contains nonionic surfactant and anionic surfactant simultaneously, thus overcomes the single use of a kind of surfactant in developing solution. existing defects, and at the same time meet the requirements of reducing the surface tension of the developer and improving the wettability of the plate

Method used

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  • Developer solution for positive lithoprinting plate

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0022] (1) Preparation of developing solution

[0023] Take 200-250ml of deionized water, add 70-75ml of sodium hydroxide (its silicon dioxide content is 8.22%, and its modulus is 3.4), and then adjust its modulus with sodium hydroxide or potassium hydroxide to make its modulus Keep it between 1.2 and 1.5, then add nonionic surfactant polyoxyethylene polyoxypropylene block copolymer and anionic surfactant sodium butylnaphthalene sulfonate, the total content is 0.5‰, nonionic surfactant and The ratio of anionic surfactant is 15:85, and finally add 1% benzyl alcohol solvent and 2% corrosion inhibitor sodium gluconate. Stirring was continued for 3 hours. Check its surface tension. The results are shown in Table 2.

[0024] (2) Development

[0025] The plate-making and developing conditions are shown in Table 1. The prepared plate was developed in a developer solution, developed by a machine, and the developing time was 20s, 30s, and the dot reduction performance was tested. ...

Embodiment 2

[0027] (1) Preparation of developing solution

[0028] Take 200-250ml of deionized water, add 70-75ml of sodium hydroxide (its silicon dioxide content is 8.22%, and its modulus is 3.4), and then adjust its modulus with sodium hydroxide or potassium hydroxide to make its modulus Keep it between 1.2 and 1.5, then add nonionic surfactant alkylphenol polyoxyethylene ether and anionic surfactant sodium dodecylbenzenesulfonate, the total weight content is 1.0‰, nonionic surfactant and The ratio of anionic surfactant is 20:80, and finally add 2% benzyl alcohol solvent and 0.1% corrosion inhibitor sodium gluconate. Stirring was continued for 5 hours. Check its surface tension. The results are shown in Table 2.

[0029] (2) Development

[0030] Plate making and developing conditions are shown in Table 1. Use the prepared plate to develop in the developer solution, adopt machine development, the development time is 20s and 30s, and test the dot reduction performance. The results a...

Embodiment 3

[0032] (1) Preparation of developing solution

[0033] Take 200-250ml of deionized water, add 70-75ml of sodium hydroxide (its silicon dioxide content is 8.22%, and its modulus is 3.4), and then adjust its modulus with sodium hydroxide or potassium hydroxide to make its modulus Keep it between 1.2 and 1.5, then add nonionic surfactant high-carbon fatty alcohol polyoxyethylene ether and anionic surfactant sodium dodecylsulfonate, the total content is 2‰, nonionic surfactant and The ratio of anionic surfactant is 25:75, and finally add 4% benzyl alcohol and 0.5% glycerin solvent. Then add 10% corrosion inhibitor tetramethylammonium chloride. Stirring was continued for 4 hours. Check its surface tension. The results are shown in Table 2.

[0034] (2) Development

[0035] Plate making and developing conditions are shown in Table 1. Use the prepared plate to develop in the developer solution, adopt machine development, the development time is 20s and 30s, and test the dot red...

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Abstract

Developer solution for a positive lithoprinting plate consists of developer proper, alkaline compounds, protective agent, wetting agent and solvent; the developer solution is characterized in that the developer solution simultaneously contains nonionic surfactant and anion surfactant with total content of 0.5-5(1000 semicolon); and the proportion of the nonionic surfactant and the anion surfactant is 15:85-25:75. The developer solution can effectively reduce the surface tension of the developer solution and improves the humidity of the plate.

Description

technical field [0001] The invention relates to a developer for lithographic plates, in particular to a developer suitable for positive lithographic plates. Background technique [0002] The purpose of developing the positive-type heat-sensitive plate is to remove the photosensitive layer that has been decomposed by light on the plate, use dilute lye as the developer, and develop the plate, leaving the photosensitive layer that has not seen light on the plate. Oleophilic slightly raised relief image. Whether the photosensitive layer of the non-image part can be completely removed from the layout after development depends on the solubility of the photosensitive layer to dilute alkali. [0003] The currently commonly used heat-sensitive plate developer is an alkaline solution, which is mainly composed of a developer, a protective agent, a wetting agent and a solvent. The developer is used to dissolve the exposed photosensitive layer of the positive CTP plate. Commonly used ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/32
Inventor 杨成祥
Owner LUCKY HUAGUANG GRAPHICS
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