Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Developer solution for positive lithoprinting plate

A technology of developing solution and lithography, applied in the field of developing solution

Inactive Publication Date: 2010-07-07
LUCKY HUAGUANG GRAPHICS
View PDF0 Cites 14 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] The object of the present invention is to provide a kind of developing solution that is suitable for positive-working lithographic plate material, and this developing solution contains nonionic surfactant and anionic surfactant simultaneously, thus overcomes the single use of a kind of surfactant in developing solution. existing defects, and at the same time meet the requirements of reducing the surface tension of the developer and improving the wettability of the plate

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Developer solution for positive lithoprinting plate

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0022] (1) Preparation of developing solution

[0023] Take 200-250ml of deionized water, add 70-75ml of sodium hydroxide (its silicon dioxide content is 8.22%, and its modulus is 3.4), and then adjust its modulus with sodium hydroxide or potassium hydroxide to make its modulus Keep it between 1.2 and 1.5, then add nonionic surfactant polyoxyethylene polyoxypropylene block copolymer and anionic surfactant sodium butylnaphthalene sulfonate, the total content is 0.5‰, nonionic surfactant and The ratio of anionic surfactant is 15:85, and finally add 1% benzyl alcohol solvent and 2% corrosion inhibitor sodium gluconate. Stirring was continued for 3 hours. Check its surface tension. The results are shown in Table 2.

[0024] (2) Development

[0025] The plate-making and developing conditions are shown in Table 1. The prepared plate was developed in a developer solution, developed by a machine, and the developing time was 20s, 30s, and the dot reduction performance was tested. ...

Embodiment 2

[0027] (1) Preparation of developing solution

[0028] Take 200-250ml of deionized water, add 70-75ml of sodium hydroxide (its silicon dioxide content is 8.22%, and its modulus is 3.4), and then adjust its modulus with sodium hydroxide or potassium hydroxide to make its modulus Keep it between 1.2 and 1.5, then add nonionic surfactant alkylphenol polyoxyethylene ether and anionic surfactant sodium dodecylbenzenesulfonate, the total weight content is 1.0‰, nonionic surfactant and The ratio of anionic surfactant is 20:80, and finally add 2% benzyl alcohol solvent and 0.1% corrosion inhibitor sodium gluconate. Stirring was continued for 5 hours. Check its surface tension. The results are shown in Table 2.

[0029] (2) Development

[0030] Plate making and developing conditions are shown in Table 1. Use the prepared plate to develop in the developer solution, adopt machine development, the development time is 20s and 30s, and test the dot reduction performance. The results a...

Embodiment 3

[0032] (1) Preparation of developing solution

[0033] Take 200-250ml of deionized water, add 70-75ml of sodium hydroxide (its silicon dioxide content is 8.22%, and its modulus is 3.4), and then adjust its modulus with sodium hydroxide or potassium hydroxide to make its modulus Keep it between 1.2 and 1.5, then add nonionic surfactant high-carbon fatty alcohol polyoxyethylene ether and anionic surfactant sodium dodecylsulfonate, the total content is 2‰, nonionic surfactant and The ratio of anionic surfactant is 25:75, and finally add 4% benzyl alcohol and 0.5% glycerin solvent. Then add 10% corrosion inhibitor tetramethylammonium chloride. Stirring was continued for 4 hours. Check its surface tension. The results are shown in Table 2.

[0034] (2) Development

[0035] Plate making and developing conditions are shown in Table 1. Use the prepared plate to develop in the developer solution, adopt machine development, the development time is 20s and 30s, and test the dot red...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

Developer solution for a positive lithoprinting plate consists of developer proper, alkaline compounds, protective agent, wetting agent and solvent; the developer solution is characterized in that the developer solution simultaneously contains nonionic surfactant and anion surfactant with total content of 0.5-5(1000 semicolon); and the proportion of the nonionic surfactant and the anion surfactant is 15:85-25:75. The developer solution can effectively reduce the surface tension of the developer solution and improves the humidity of the plate.

Description

technical field [0001] The invention relates to a developer for lithographic plates, in particular to a developer suitable for positive lithographic plates. Background technique [0002] The purpose of developing the positive-type heat-sensitive plate is to remove the photosensitive layer that has been decomposed by light on the plate, use dilute lye as the developer, and develop the plate, leaving the photosensitive layer that has not seen light on the plate. Oleophilic slightly raised relief image. Whether the photosensitive layer of the non-image part can be completely removed from the layout after development depends on the solubility of the photosensitive layer to dilute alkali. [0003] The currently commonly used heat-sensitive plate developer is an alkaline solution, which is mainly composed of a developer, a protective agent, a wetting agent and a solvent. The developer is used to dissolve the exposed photosensitive layer of the positive CTP plate. Commonly used ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/32
Inventor 杨成祥
Owner LUCKY HUAGUANG GRAPHICS
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com