A kind of mems microbridge structure contact hole preparation method
A technology of micro-bridge structure and contact hole, which is applied in the direction of micro-structure technology, micro-structure devices, manufacturing micro-structure devices, etc., can solve the problems of difficult precise control of alignment accuracy, high R&D and production costs, and achieve improved alignment accuracy and Effect of Process Window, Improved Performance, and Avoided Alignment Errors
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[0028] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings.
[0029] figure 1 The flow chart of the first specific embodiment of the method for preparing the contact hole of the MEMS microbridge structure provided by the present invention.
[0030] Such as figure 1 As shown, the MEMS microbridge structure contact hole preparation method provided in this specific embodiment includes the following steps:
[0031] In step one, the reflection layer 103 and the dielectric layer 102 are sequentially prepared on the silicon substrate 101 .
[0032] In this step, the reflective layer 103 used as the connecting electrode is first grown, patterned by photolithography, and then the dielectric layer 102 is deposited and polished by chemical mechanical polishing (CMP) until the surface of the reflective layer 103 is exposed. The mater...
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